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Analysis of nano-filament evolution in Ni-based RRAM devices using in-situ TEM

  • Chaolun Wang
  • , Xing Wu*
  • *此作品的通讯作者
  • East China Normal University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Resistive switching materials with the potential of being a promising candidate for nonvolatile data storage and reconfiguration of electronic applications have been intensively studied. Here we present the mechanisms of highly repeatable resistive switching of Ni based random access memory device. In-situ transmission electron microscopy was used to study the real time evolution of the physical structure and the chemical composition of the nanofilament during resistive switching. Formation and breakdown of single/multiple nanofilaments was observed during the SET and RESET process, which results in an abrupt current change. Oxygen vacancies generated during soft breakdown become the metal atom migration path where forms and breaks the nanofilament under the voltage strike circulation.

源语言英语
主期刊名2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Proceedings
编辑Yu-Long Jiang, Ting-Ao Tang, Ru Huang
出版商Institute of Electrical and Electronics Engineers Inc.
876-879
页数4
ISBN(电子版)9781467397179
DOI
出版状态已出版 - 2016
活动13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Hangzhou, 中国
期限: 25 10月 201628 10月 2016

出版系列

姓名2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016 - Proceedings

会议

会议13th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2016
国家/地区中国
Hangzhou
时期25/10/1628/10/16

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