跳到主要导航 跳到搜索 跳到主要内容

Ablation mechanism of fused silica under femtosecond laser pulse

  • Shizhen Xu*
  • , Zhizhan Xu
  • , Tianqin Jia
  • , Haiyi Sun
  • , Xiaoxi Li
  • , Donghai Feng
  • , Chengbin Li
  • *此作品的通讯作者
  • CAS - Shanghai Institute of Optics and Fine Mechanics

科研成果: 期刊稿件 › 会议文章 › 同行评审

摘要

Based on the avalanche model, the mechanism of femtosecond laser-induced ablation in fused silica was investigated. The three microscopic processes, including the production of conduction band electrons (CBE), the deposition of laser energy, and the diffusion of CBE and energy, were solved by a finite element method (FEM) of two-dimension cylinder coordinate. The conduction band electrons (CBE) were produced through photoionization and impact ionization, which were calculated via Keldysh theory and Double-flux model, respectively. The accumulated charge and the electrostatic field were also calculated, and the evolution of microexplosion was discussed based on this model. The results indicate that the CBE and energy diffusion plays an important role in the ablation of dielectrics by femtosecond laser pulse.

源语言英语
期刊论文编号44
页(从-至)291-298
页数8
期刊Proceedings of SPIE - The International Society for Optical Engineering
卷5629
DOI
出版状态已出版 - 2005
已对外发布是
活动Lasers in Material Processing and Manufacturing II - Beijing, 中国
期限: 10 11月 2004 → 12 11月 2004

学术指纹

探究 'Ablation mechanism of fused silica under femtosecond laser pulse' 的科研主题。它们共同构成独一无二的学术指纹。

引用此