摘要
Oxygen ions with 40 keV energy and doses of 1 × 1012 to 5 × 1014/cm2 were implanted into ferroelectric Pb(Zr,Ti)O3 (PZT) thin films. X-ray diffraction patterns show that no obvious difference appears in the crystalline structure of PZT films before and after implantation; however, measurement of electrical properties shows that both remanent polarization and dielectric constant of the film decrease with increase of the implanted ion dose. The PZT film will completely become a linear dielectric if the implanted ion dose increases to 5 × 1014/cm2. A possible mechanism for the loss of remanent polarization after ion implantation is proposed.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 621-623 |
| 页数 | 3 |
| 期刊 | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| 卷 | 127-128 |
| DOI | |
| 出版状态 | 已出版 - 5月 1997 |
| 已对外发布 | 是 |
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