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A study of oxygen ion implantation into ferroelectric Pb(Zr,Ti)O3 films

科研成果: 期刊稿件文章同行评审

摘要

Oxygen ions with 40 keV energy and doses of 1 × 1012 to 5 × 1014/cm2 were implanted into ferroelectric Pb(Zr,Ti)O3 (PZT) thin films. X-ray diffraction patterns show that no obvious difference appears in the crystalline structure of PZT films before and after implantation; however, measurement of electrical properties shows that both remanent polarization and dielectric constant of the film decrease with increase of the implanted ion dose. The PZT film will completely become a linear dielectric if the implanted ion dose increases to 5 × 1014/cm2. A possible mechanism for the loss of remanent polarization after ion implantation is proposed.

源语言英语
页(从-至)621-623
页数3
期刊Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
127-128
DOI
出版状态已出版 - 5月 1997
已对外发布

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