摘要
Compact and broadband millimeter-wave (MMW) single-pole-double-throw (SPDT) switches in GlobalFoundries 45nm SOI technology was presented. A full-band SPDT switch with series and shunt structure, and a Ka-band SPDT switch with two-stages shunt transistors were included in the design. Coplanar waveguide (CPW) series stubs were adopted to realize small reactance. In addition, negative body bias technology was utilized to enhance the performance of the switch over millimeter-wave band. The fabricated chip occupied a core area of 0.35 mm ×0.16 mm. Measurement results of the full-band SPDT switch show an insertion loss less than 4 dB and isolation better than 24 dB over DC~94 GHz. For the Ka-band SPDT switch, insertion loss is 2.5~3.2 dB and isolation is better than 19 dB over 25~45 GHz.
| 投稿的翻译标题 | Design of Ultra-broadband Millimeter-wave SPDT Switch Based on 45 nm SOI Technology |
|---|---|
| 源语言 | 繁体中文 |
| 页(从-至) | 262-267 and 273 |
| 期刊 | Guti Dianzixue Yanjiu Yu Jinzhan/Research and Progress of Solid State Electronics |
| 卷 | 38 |
| 期 | 4 |
| 出版状态 | 已出版 - 25 8月 2018 |
关键词
- 45 nm SOI
- Negative body bias
- Single-pole-double-throw (SPDT)
- Ultra-broadband
指纹
探究 '基于45 nm SOI工艺的超宽带毫米波' 的科研主题。它们共同构成独一无二的指纹。引用此
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