摘要
A set of high resolution microscopic imaging system based on long-distance microscopic objective lens is designed and processed to meet the needs of high resolution imaging of ultracold atoms. The simulation results show that the numerical aperture of the designed high resolution microscopic imaging optical system is 0. 55 near 671 nm wavelength, the working distance is up to 14 mm, and the optical transfer function (MTF) curve approaches the theoretical diffraction limit in the field of view of 200 μm×200 μm. The experimental results of the actual point source diffraction show that the resolution of the microscopic imaging objective lens system is better than 1 μm when the pinhole with a diameter of (300±50) nm is used as the point light source, and the aberration introduced by the vacuum window with a thickness of 3. 35 mm can be corrected and the resolution of the ultracold quantum gas imaging system can be improved. By precisely controlling the lens spacing in the tube, the high-resolution microscopic imaging system can be applied to other commonly used ultracold atoms, such as Na, K, and Rb, and provide a more intuitive and convenient imaging detection tool for ultracold quantum gas experiments.
| 投稿的翻译标题 | Design and Test of High-Resolution Imaging System for Ultracold Atoms |
|---|---|
| 源语言 | 繁体中文 |
| 文章编号 | 0222001 |
| 期刊 | Laser and Optoelectronics Progress |
| 卷 | 59 |
| 期 | 2 |
| DOI | |
| 出版状态 | 已出版 - 2022 |
关键词
- Aberration
- Diffraction limit
- High-resolution in situ imaging
- Li ultracold Fermi gas
- Optical design
指纹
探究 '冷 原 子 高 分 辨 率 原 位 成 像 系 统 设 计 与 测 试' 的科研主题。它们共同构成独一无二的指纹。引用此
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