Abstract
We develop photolithography assisted chemo-mechanical etching (PLACE) and apply it for fabricating PICs on TFLN, ranging from low-loss optical delay lines and photonic neural network to EO tunable lasers and high-power waveguide amplifiers.
| Original language | English |
|---|---|
| Title of host publication | OECC/PSC 2025 - 30th OptoElectronics and Communications Conference/International Conference on Photonics in Switching and Computing 2025 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Edition | 2025 |
| ISBN (Electronic) | 9784885523526 |
| DOIs | |
| State | Published - 2025 |
| Event | 30th OptoElectronics and Communications Conference and 2025 International Conference on Photonics in Switching and Computing, OECC/PSC 2025 - Sapporo, Japan Duration: 29 Jun 2025 → 3 Jul 2025 |
Conference
| Conference | 30th OptoElectronics and Communications Conference and 2025 International Conference on Photonics in Switching and Computing, OECC/PSC 2025 |
|---|---|
| Country/Territory | Japan |
| City | Sapporo |
| Period | 29/06/25 → 3/07/25 |
Keywords
- Photonic integration
- Thin film lithium niobate passive devices
- Waveguide amplifiers and lasers