TY - JOUR
T1 - Wafer-Scale (100)-Oriented Te Single-Crystalline Thin Films with Exceptional Electronic and Photodetection Performance
AU - Hu, Tao
AU - Chen, Qiaochu
AU - Zhao, Dongyang
AU - Cao, Hechun
AU - Jia, Yu
AU - Huo, Guanghui
AU - Chen, Yan
AU - Wang, Xudong
AU - Yang, Jing
AU - Zhang, Yuanyuan
AU - Wu, Yuning
AU - Tang, Xiaodong
AU - Bai, Wei
AU - Wang, Jianlu
AU - Chu, Junhao
N1 - Publisher Copyright:
© 2026 Wiley-VCH GmbH.
PY - 2026
Y1 - 2026
N2 - Te displays the potentials in chirality, anisotropic electronics, and optoelectronics owing to its unique chiral chain lattice structure. However, the specifically oriented growth is still challenging thanks to a lack of lattice-matched substrates. Herein, (100)-oriented Te single-crystalline films are grown via a van der Waals epitaxial (vdWE) mode. Wafer-scale and high-crystal quality with a low full width at half maximum (0.25°) and an ultrahigh hole Hall mobility (1267.2 cm2V−1s−1) are yielded in the 58.2 nm. In-plane anisotropic transport is present in these vdWE films, and exceptional current switching is displayed in the ones below 21.3 nm. Photoresponse performance increases with the film thickness while the polarization effect is absent above the 23.5 nm. Broadband detection from 420 to 2000 nm is demonstrated. Peak responsivity, detectivity, and external quantum efficiency reach 2.97 × 104 A/W, 1.21 × 1013 Jones, and 7.12 × 104% at 520 nm in the 58.2 nm field-effect transistor (FET). Dual-symmetric polarization effect is revealed in the 11.2 nm FET detectors with a polarization ratio of 1.11 at 1650 nm and 1.04 at 638 nm. This work presents a scalable growth route for (100)-oriented Te and highlights the potential in integrated, high-speed, and polarized devices.
AB - Te displays the potentials in chirality, anisotropic electronics, and optoelectronics owing to its unique chiral chain lattice structure. However, the specifically oriented growth is still challenging thanks to a lack of lattice-matched substrates. Herein, (100)-oriented Te single-crystalline films are grown via a van der Waals epitaxial (vdWE) mode. Wafer-scale and high-crystal quality with a low full width at half maximum (0.25°) and an ultrahigh hole Hall mobility (1267.2 cm2V−1s−1) are yielded in the 58.2 nm. In-plane anisotropic transport is present in these vdWE films, and exceptional current switching is displayed in the ones below 21.3 nm. Photoresponse performance increases with the film thickness while the polarization effect is absent above the 23.5 nm. Broadband detection from 420 to 2000 nm is demonstrated. Peak responsivity, detectivity, and external quantum efficiency reach 2.97 × 104 A/W, 1.21 × 1013 Jones, and 7.12 × 104% at 520 nm in the 58.2 nm field-effect transistor (FET). Dual-symmetric polarization effect is revealed in the 11.2 nm FET detectors with a polarization ratio of 1.11 at 1650 nm and 1.04 at 638 nm. This work presents a scalable growth route for (100)-oriented Te and highlights the potential in integrated, high-speed, and polarized devices.
KW - anisotropic behaviors
KW - molecular beam epitaxy (MBE)
KW - photodetectors
KW - single-crystalline Te thin films
KW - wafer-scale
UR - https://www.scopus.com/pages/publications/105026585489
U2 - 10.1002/smll.202513317
DO - 10.1002/smll.202513317
M3 - 文章
AN - SCOPUS:105026585489
SN - 1613-6810
JO - Small
JF - Small
ER -