Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector

Hai Yi Sun; Tian Qing Jia; Xiao Xi Li; Shi Zhen Xu; Dong Hai Feng; Cheng Bin Li; Xiao Feng Wang; Zhi Zhan Xu

doi:10.7498/aps.54.4736

Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector

Hai Yi Sun^*
, Tian Qing Jia
, Xiao Xi Li
, Shi Zhen Xu
, Dong Hai Feng
, Cheng Bin Li
, Xiao Feng Wang
, Zhi Zhan Xu

^*Corresponding author for this work

CAS - Shanghai Institute of Optics and Fine Mechanics

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The omnidirectional reflector SiO₂/TiO₂ is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-resolved excitation processes and damage mechanisms in omnidirectional reflector SiO₂/TiO₂ is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.

Original language	English
Pages (from-to)	4736-4740
Number of pages	5
Journal	Wuli Xuebao/Acta Physica Sinica
Volume	54
Issue number	10
DOIs	https://doi.org/10.7498/aps.54.4736
State	Published - Oct 2005
Externally published	Yes

Keywords

Damage mechanisms
Excitation processes
Femtosecond laser
Omnidirectional reflector

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10.7498/aps.54.4736

Cite this

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title = "Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector",

abstract = "The omnidirectional reflector SiO2/TiO2 is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-resolved excitation processes and damage mechanisms in omnidirectional reflector SiO2/TiO2 is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.",

keywords = "Damage mechanisms, Excitation processes, Femtosecond laser, Omnidirectional reflector",

author = "Sun, \{Hai Yi\} and Jia, \{Tian Qing\} and Li, \{Xiao Xi\} and Xu, \{Shi Zhen\} and Feng, \{Dong Hai\} and Li, \{Cheng Bin\} and Wang, \{Xiao Feng\} and Xu, \{Zhi Zhan\}",

year = "2005",

month = oct,

doi = "10.7498/aps.54.4736",

language = "英语",

volume = "54",

pages = "4736--4740",

journal = "Wuli Xuebao/Acta Physica Sinica",

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TY - JOUR

T1 - Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector

AU - Sun, Hai Yi

AU - Jia, Tian Qing

AU - Li, Xiao Xi

AU - Xu, Shi Zhen

AU - Feng, Dong Hai

AU - Li, Cheng Bin

AU - Wang, Xiao Feng

AU - Xu, Zhi Zhan

PY - 2005/10

Y1 - 2005/10

N2 - The omnidirectional reflector SiO2/TiO2 is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-resolved excitation processes and damage mechanisms in omnidirectional reflector SiO2/TiO2 is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.

AB - The omnidirectional reflector SiO2/TiO2 is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-resolved excitation processes and damage mechanisms in omnidirectional reflector SiO2/TiO2 is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.

KW - Damage mechanisms

KW - Excitation processes

KW - Femtosecond laser

KW - Omnidirectional reflector

UR - https://www.scopus.com/pages/publications/27544516076

U2 - 10.7498/aps.54.4736

DO - 10.7498/aps.54.4736

M3 - 文章

AN - SCOPUS:27544516076

SN - 1000-3290

VL - 54

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JO - Wuli Xuebao/Acta Physica Sinica

JF - Wuli Xuebao/Acta Physica Sinica

IS - 10

ER -

Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector

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Keywords

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