@inproceedings{128b529b1bc14e3d8b53af9b6dcc2069,
title = "Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics",
abstract = "Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating high-quality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) microresonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high-repetition-rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing.",
keywords = "femtosecond laser micromachining, photolithography, photonic integrated circuit, thin film lithium niobate",
author = "Jinming Chen and Zhaoxiang Liu and Lvbin Song and Chao Sun and Guanhua Wang and Ya Cheng",
note = "Publisher Copyright: {\textcopyright} 2023 SPIE.; Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXIII 2023 ; Conference date: 29-01-2023 Through 31-01-2023",
year = "2023",
doi = "10.1117/12.2657586",
language = "英语",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Herman, \{Peter R.\} and Roberto Osellame and Adela Ben-Yakar",
booktitle = "Frontiers in Ultrafast Optics",
address = "美国",
}