Skip to main navigation Skip to search Skip to main content

UiO-66(Zr)-derived t-zirconia with abundant lattice defect for remarkably enhanced arsenic removal

  • Guojuan Qu
  • , Peng Jia
  • , Tao Zhang
  • , Zongchen Li
  • , Changxun Chen
  • , Yaping Zhao*
  • *Corresponding author for this work
  • East China Normal University
  • Institute of Eco-Chongming (IEC)

Research output: Contribution to journalArticlepeer-review

Abstract

Zirconium oxide (ZrO2) exhibits great potential in the remediation of arsenic-polluted water. In this study, tetragonal zirconium oxide (t-ZrO2) with high lattice defects was facilely fabricated by regulating the Zr-metal-organic framework (MOF) (UiO-66) with sodium acetate modulator and examined to adsorb arsenic from water. Benefitting from the synergistic effects of mesopores structure and lattice defect, t-ZrO2 exhibited ultrahigh adsorption capacity and faster kinetics towards both arsenate (As(V)) and arsenite (As(III)). The Langmuir adsorption capacity for As(V) and As(III) of 147.5 mg g−1 and 352.1 mg g−1 on t-ZrO2 in exothermic process, respectively, significantly outperforming reported counterparts in literature (generally ≤100 mg g−1). The faster adsorption kinetic of both As(III) and As(V) on t-ZrO2 is defined favorably by the pseudo-second-order model over a wide pH (3–11). Furthermore, arsenic is mainly captured by t-ZrO2 via forming Zr–O–As bonds through occupying coordinatively unsaturated zirconium atoms adsorption sites revealed by the X-ray photoelectron spectroscopy (XPS) spectrum and Fourier-transformed infrared (FTIR) spectra analysis. This study offers a new strategy for designing ultrahigh performance Zr-MOF-derived adsorbents for capturing arsenic.

Original languageEnglish
Article number132594
JournalChemosphere
Volume288
DOIs
StatePublished - Feb 2022

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 3 - Good Health and Well-being
    SDG 3 Good Health and Well-being

Keywords

  • Adsorption
  • Arsenic
  • Lattice defect
  • MOF-Derived
  • Tetragonal zirconium oxide

Fingerprint

Dive into the research topics of 'UiO-66(Zr)-derived t-zirconia with abundant lattice defect for remarkably enhanced arsenic removal'. Together they form a unique fingerprint.

Cite this