Two-dimensional negative capacitance transistor with polyvinylidene fluoride-based ferroelectric polymer gating

Xudong Wang, Yan Chen, Guangjian Wu, Dan Li, Luqi Tu, Shuo Sun, Hong Shen, Tie Lin, Yongguang Xiao, Minghua Tang, Weida Hu, Lei Liao, Peng Zhou, Jinglan Sun, Xiangjian Meng, Junhao Chu, Jianlu Wang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

100 Scopus citations

Abstract

Conventional field-effect transistors (FETs) are not expected to satisfy the requirements of future large integrated nanoelectronic circuits because of these circuits’ ultra-high power dissipation and because the conventional FETs cannot overcome the subthreshold swing (SS) limit of 60 mV/decade. In this work, the ordinary oxide of the FET is replaced only by a ferroelectric (Fe) polymer, poly(vinylidene difluoride-trifluoroethylene) (P(VDF-TrFE)). Additionally, we employ a two-dimensional (2D) semiconductor, such as MoS2 and MoSe2, as the channel. This 2D Fe-FET achieves an ultralow SS of 24.2 mV/dec over four orders of magnitude in drain current at room temperature; this sub-60 mV/dec switching is derived from the Fe negative capacitance (NC) effect during the polarization of ferroelectric domain switching. Such 2D NC-FETs, realized by integrating of 2D semiconductors and organic ferroelectrics, provide a new approach to satisfy the requirements of next-generation low-energy-consumption integrated nanoelectronic circuits as well as the requirements of future flexible electronics.

Original languageEnglish
Article number38
Journalnpj 2D Materials and Applications
Volume1
Issue number1
DOIs
StatePublished - 1 Dec 2017
Externally publishedYes

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