Three-Dimensional Limit of Bulk Rashba Effect in Ferroelectric Semiconductor GeTe

Xu Yang, Xiao Mei Li, Yang Li, Yan Li, Rui Sun, Jia Nan Liu, Xuedong Bai, Na Li, Zong Kai Xie, Lei Su, Zi Zhao Gong, Xiang Qun Zhang, Wei He, Zhaohua Cheng

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Ferroelectric Rashba semiconductors (FERSCs) have recently attracted intensive attention due to their giant bulk Rashba parameter, αR, which results in a locking between the spin degrees of freedom and the switchable electric polarization. However, the integration of FERSCs into microelectronic devices has provoked questions concerning whether the Rashba effect can persist when the material thickness is reduced to several nanometers. Here we find that αR can keep a large value of 2.12 eV Å in the 5.0 nm thick GeTe film. The behavior of αR with thickness can be expressed by the scaling law and provides a 3D thickness limit of the bulk Rashba effect, dc = 2.1 ± 0.5 nm. Finally, we find that the thickness can modify the Berry curvature as well, which influences the polarization and consequently alters the αR. Our results give insight into understanding the factors influencing αR in FERSCs and pave a novel route for designing Rashba-type quantum materials.

Original languageEnglish
Pages (from-to)77-83
Number of pages7
JournalNano Letters
Volume21
Issue number1
DOIs
StatePublished - 13 Jan 2021
Externally publishedYes

Keywords

  • Bulk Rashba Effect
  • Carrier Concentration
  • Ferroelectric Rashba Semiconductors
  • Rashba Parameter
  • Scaling Law
  • Size Effect

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