TY - JOUR
T1 - Three-dimensional isotropic microfabrication in glass using spatiotemporal focusing of high-repetition-rate femtosecond laser pulses
AU - Tan, Yuanxin
AU - Lv, Haotian
AU - Xu, Jian
AU - Zhang, Aodong
AU - Song, Yunpeng
AU - Yu, Jianping
AU - Chen, Wei
AU - Wan, Yuexin
AU - Liu, Zhaoxiang
AU - Liu, Zhaohui
AU - Qi, Jia
AU - Cai, Yangjian
AU - Cheng, Ya
N1 - Publisher Copyright:
© The Author(s) 2023. Published by Institute of Optics and Electronics, Chinese Academy of Sciences.
PY - 2023
Y1 - 2023
N2 - To improve the processing efficiency and extend the tuning range of 3D isotropic fabrication, we apply the simultaneous spatiotemporal focusing (SSTF) technique to a high-repetition-rate femtosecond (fs) fiber laser system. In the SSTF scheme, we propose a pulse compensation scheme for the fiber laser with a narrow spectral bandwidth by building an extra-cavity pulse stretcher. We further demonstrate truly 3D isotropic microfabrication in photosensitive glass with a tunable resolution ranging from 8 μm to 22 μm using the SSTF of fs laser pulses. Moreover, we systematically investigate the influences of pulse energy, writing speed, processing depth, and spherical aberration on the fabrication resolution. As a proof-of-concept demonstration, the SSTF scheme was further employed for the fs laser-assisted etching of complic-ated glass microfluidic structures with 3D uniform sizes. The developed technique can be extended to many applications such as advanced photonics, 3D biomimetic printing, micro-electromechanical systems, and lab-on-a-chips.
AB - To improve the processing efficiency and extend the tuning range of 3D isotropic fabrication, we apply the simultaneous spatiotemporal focusing (SSTF) technique to a high-repetition-rate femtosecond (fs) fiber laser system. In the SSTF scheme, we propose a pulse compensation scheme for the fiber laser with a narrow spectral bandwidth by building an extra-cavity pulse stretcher. We further demonstrate truly 3D isotropic microfabrication in photosensitive glass with a tunable resolution ranging from 8 μm to 22 μm using the SSTF of fs laser pulses. Moreover, we systematically investigate the influences of pulse energy, writing speed, processing depth, and spherical aberration on the fabrication resolution. As a proof-of-concept demonstration, the SSTF scheme was further employed for the fs laser-assisted etching of complic-ated glass microfluidic structures with 3D uniform sizes. The developed technique can be extended to many applications such as advanced photonics, 3D biomimetic printing, micro-electromechanical systems, and lab-on-a-chips.
KW - 3D isotropic fabrication
KW - chemical etching
KW - pulse compensation
KW - pulse stretcher
KW - simultaneous spatiotemporal focusing technique
UR - https://www.scopus.com/pages/publications/85175876071
U2 - 10.29026/oea.2023.230066
DO - 10.29026/oea.2023.230066
M3 - 文章
AN - SCOPUS:85175876071
SN - 2096-4579
VL - 6
JO - Opto-Electronic Advances
JF - Opto-Electronic Advances
IS - 10
M1 - 230066
ER -