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Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching

  • Lang Gao
  • , Youting Liang
  • , Lvbin Song
  • , Difeng Yin
  • , Jia Qi
  • , Jinming Chen
  • , Zhaoxiang Liu
  • , Jianping Yu
  • , Jian Liu
  • , Haisu Zhang
  • , Zhiwei Fang
  • , Hongxin Qi
  • , Ya Cheng*
  • *Corresponding author for this work

Research output: Contribution to journalLetterpeer-review

Abstract

We report an electro-optic isolator fabricated on thin-film lithium niobate by photolithography-assisted chemo-mechanical etching that shows an isolation of 39.50 dB and an overall fiber-to-fiber loss of 2.6 dB.

Original languageEnglish
Pages (from-to)614-617
Number of pages4
JournalOptics Letters
Volume49
Issue number3
DOIs
StatePublished - Feb 2024

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