Abstract
Thin film field-effect phototransistors (FETs) can be developed from bandgap-tunable, solution-processed, few-layer reduced graphene oxide (FRGO) films. Large-area FRGO films with tunable bandgaps ranging from 2.2 eV to 0.5 eV can be achieved readily by solution-processing technique such as spin-coating. The electronic and optoelectronic properties of FRGO FETs are found to be closely related to their bandgap energy. The resulting phototransistor has great application potential in the field of photodetection.
| Original language | English |
|---|---|
| Pages (from-to) | 4872-4876 |
| Number of pages | 5 |
| Journal | Advanced Materials |
| Volume | 22 |
| Issue number | 43 |
| DOIs | |
| State | Published - 16 Nov 2010 |
| Externally published | Yes |
Keywords
- bandgap
- field-effect
- graphene
- phototransistor
- solution processable