The structural and magnetic properties of τ-MnAl films prepared by Mn/Al multilayers deposition plus annealing

  • C. Y. Duan
  • , X. P. Qiu
  • , B. Ma*
  • , Z. Z. Zhang
  • , Q. Y. Jin
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

The structural and magnetic properties of τ-MnAl alloy films are studied. The films are derived by annealing from Mn/Al multilayers. τ-MnAl appears when the annealing temperature increases up to 350 °C, but decomposes into γ2-MnAl and β-Mn at 500 °C annealing. Good magnetic properties are obtained after 400-450 °C annealing. Furthermore, τ-MnAl forms in the Mn-Al interface. The saturation magnetization MS increases first with the thickness of Mn (or Al) layers, and then decreases in inverse proportion to that of Mn (or Al) layers. The turning point implies that the thickness of τ-MnAl is no more than 5 nm in the Mn60Al40 films.

Original languageEnglish
Pages (from-to)185-188
Number of pages4
JournalMaterials Science and Engineering: B
Volume162
Issue number3
DOIs
StatePublished - 15 Jun 2009
Externally publishedYes

Keywords

  • Annealing
  • Interface
  • Multilayers
  • τ-MnAl

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