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The role of gap states on energy level alignment at an α-NPD/HAT(CN)6 charge generation interface

  • Jin Peng Yang*
  • , Fabio Bussolotti
  • , Yan Qing Li
  • , Xiang Hua Zeng
  • , Satoshi Kera
  • , Jian Xin Tang
  • , Nobuo Ueno
  • *Corresponding author for this work
  • Chiba University
  • Yangzhou University
  • National Institutes of Natural Sciences - Institute for Molecular Science
  • Soochow University

Research output: Contribution to journalArticlepeer-review

Abstract

We report the effect of gap states on energy level alignment in a typical organic charge generation interface of N,N-bis(1-naphthyl)-N,N-diphenyl-1,1-biphenyl-4,4-diamine (α-NPD)/hexaazatriphenylene-hexacarbonitrile [HAT(CN)6] by using ultraviolet and X-ray photoemission spectroscopy. The gap states tailed from the highest occupied molecular orbital (HOMO) onset of α-NPD dominate the Fermi level pinning at the α-NPD(<1.6 nm)/HAT(CN)6 interface, which is favorable for charges generation upon bias operation and facilitates the electron injection from the HOMO-tail region of α-NPD to the lowest unoccupied molecular orbital (LUMO) region of HAT(CN)6.

Original languageEnglish
Pages (from-to)120-124
Number of pages5
JournalOrganic Electronics
Volume24
DOIs
StatePublished - 3 Jun 2015
Externally publishedYes

Keywords

  • Charge generation layer
  • Energy level alignment
  • Gap states
  • Ultraviolet photoelectron spectroscopy

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