Abstract
We study the nanoscale electrical damage of Ge2Sb2Te5 (GST) phase-change films during crystallization by conductive atomic force microscopy (C-AFM) and Raman spectra. Amorphous GST ( a -GST) can be converted to crystalline GST ( c -GST) by applying an exciting direct current (DC) bias (8 V) between the tip and the GST surface. Furthermore, as film thickness increased, the electrical-induced region of GST films revealed a gradual increase in electrical damage and improved crystallinity. It shows that GST films with a thickness of 70 nm have a better crystallization ratio of 20.5 % and less electrical damage with a volume expansion rate of 19.1±6.5%.
| Original language | English |
|---|---|
| Pages (from-to) | 488-491 |
| Number of pages | 4 |
| Journal | IEEE Electron Device Letters |
| Volume | 44 |
| Issue number | 3 |
| DOIs | |
| State | Published - 1 Mar 2023 |
Keywords
- C-AFM
- GST films
- Joule heat
- crystallinity
- phase-change