The Nanoscale Electrical Damage Mechanism of GeSbTe Phase-Change Films Discovered by Conductive Atomic Force Microscopy

Xionghu Xu, Ming Li, Shubing Li, Anyang Cui, Menghan Deng, Kai Jiang, Liangqing Zhu, Liyan Shang, Junhao Chu, Zhigao Hu

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

We study the nanoscale electrical damage of Ge2Sb2Te5 (GST) phase-change films during crystallization by conductive atomic force microscopy (C-AFM) and Raman spectra. Amorphous GST ( a -GST) can be converted to crystalline GST ( c -GST) by applying an exciting direct current (DC) bias (8 V) between the tip and the GST surface. Furthermore, as film thickness increased, the electrical-induced region of GST films revealed a gradual increase in electrical damage and improved crystallinity. It shows that GST films with a thickness of 70 nm have a better crystallization ratio of 20.5 % and less electrical damage with a volume expansion rate of 19.1±6.5%.

Original languageEnglish
Pages (from-to)488-491
Number of pages4
JournalIEEE Electron Device Letters
Volume44
Issue number3
DOIs
StatePublished - 1 Mar 2023

Keywords

  • C-AFM
  • GST films
  • Joule heat
  • crystallinity
  • phase-change

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