@inproceedings{d25ab048634e4f5fbc75551bcfe06048,
title = "The improvement of electrochemical etching process for silicon microchannel plates",
abstract = "Silicon microchannel plates have been explored intensively for numerous applications especially for ultraviolet image detection. The electrochemical etching in hydrofluoric acid-based solutions is known as a technique for porous silicon formation. The function of backside illumination and temperature in the electrochemical etching of large-size and high aspect ratio silicon microchannels plates has been reported in this paper. The backside illumination was provided by a set of triple 150 W tungsten-halogen lamps with a feedback-loop which keeps the constant current density. And a circulation system was set up to maintain the etching temperature. It was found that proper backside illumination and lower temperature can form an improved etching condition in which etching may result in smoother undercut and better surface topography for large-size silicon microchannel plates.",
keywords = "Backside illumination, Photon-ectrochemical etching, Silicon microchannel plates, Temperature, Undercut",
author = "Ding Yuan and Pengliang Ci and Fei Tian and Jing Shi and Shaohui Xu and Peisheng Xin and Lianwei Wang",
year = "2009",
doi = "10.1109/NEMS.2009.5068734",
language = "英语",
isbn = "9781424446308",
series = "4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009",
pages = "964--969",
booktitle = "4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009",
note = "4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009 ; Conference date: 05-01-2009 Through 08-01-2009",
}