The effect of Si co-doping on defect-induced intrinsic magnetism in GaN

  • Lei Zhang
  • , Huai Zhong Xing*
  • , Yan Huang
  • , Hui Yuan Zhang
  • , Ji Qing Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Using the first principle method within the local spin density approximation, both the magnetism of defect induced in GaN and the effect of Si co-doping on the magnetism in GaN with defect were investigated. It was found that defect-induced intrinsic magnetic moment of GaN is 3 μB, while the magnetic moment is quenched to 2 μB in Si-co-doping GaN:Si. The magnetic moment decreases with the increase of the concentration of Si. The result is very helpful for experiments.

Original languageEnglish
Pages (from-to)229-231+249
JournalHongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves
Volume30
Issue number3
DOIs
StatePublished - Jun 2011

Keywords

  • GaN:Si
  • Magnetism
  • The first principle

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