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The effect of Cu/Mo bi-layer film on the structural, morphological and electro-optical characteristics of AZO/metal/AZO transparent conductive film

  • Yixin Guo
  • , Wenjuan Cheng*
  • , Jinchun Jiang
  • , Shaohua Zuo
  • , Fuwen Shi
  • , Junhao Chu
  • *Corresponding author for this work
  • East China Normal University
  • Shanghai Center for Photovoltaics
  • CAS - Shanghai Institute of Technical Physics

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper, AZO/Mo, AZO/Mo/AZO and AZO/Cu/Mo/AZO multi-layer films were prepared on soda-lime glass and Si(100) substrate by magnetron sputtering at room temperature. The effect of Mo and Cu layer thickness on the structural, morphological and electro-optical properties of the multilayer films was discussed. The film with inserted 6 nm and 9 nm Mo layer achieved the best factor of merit for AZO/Mo and AZO/Mo/AZO structure respectively. The optoelectronic properties of multi-layer films were significantly improved by introducing a thin Cu layer at the interface between Mo and AZO films. The low sheet resistance of 45 Ω/sq and a transmittance of 78% were obtained by AZO (50 nm)/Cu(3 nm)/Mo (6 nm)/AZO (50 nm) structure. The result shows thin Cu layer may improve the optoelectronic properties of AZO/Mo/AZO film, which making it more suitable for application in optoelectronic device.

Original languageEnglish
Pages (from-to)164-169
Number of pages6
JournalVacuum
Volume131
DOIs
StatePublished - 1 Sep 2016

Keywords

  • Cu/Mo
  • Magnetron sputtering
  • Multi-layer film
  • Transparent conducting oxide

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