Abstract
Reactive deposition—solid phase epitaxy has been developed for the epitaxial growth of thick β-fesi2 film. Compared with the solid phase epitaxy, the crystal quality was improved. The orientation relationship mainly depends on the depositing condition. Observation by transmission electron microscope revealed the polycrystalline nature and the mean crystallite size was about 200 nm.
| Original language | English |
|---|---|
| Pages (from-to) | 301-304 |
| Number of pages | 4 |
| Journal | Chinese Physics Letters |
| Volume | 12 |
| Issue number | 5 |
| DOIs | |
| State | Published - May 1995 |
| Externally published | Yes |