Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Ya Peng Fang; Wei He; Hao Liang Liustm; Qing Feng Zhan; Hai Feng Du; Qiong Wu; Hai Tao Yang; Xiang Qun Zhang; Zhao Hua Cheng

doi:10.1063/1.3463458

Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Ya Peng Fang, Wei He, Hao Liang Liustm, Qing Feng Zhan, Hai Feng Du, Qiong Wu, Hai Tao Yang, Xiang Qun Zhang, Zhao Hua Cheng

Chinese Academy of Sciences

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is K_u =1.7× 105 erg/ cm³, which is consistent with Kshape =1.1× 10⁵ erg/ cm³ calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.

Original language	English
Article number	022507
Journal	Applied Physics Letters
Volume	97
Issue number	2
DOIs	https://doi.org/10.1063/1.3463458
State	Published - 12 Jul 2010
Externally published	Yes

Access to Document

10.1063/1.3463458

Cite this

@article{84d098666efd4d1796ff4ff64bdadd76,

title = "Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films",

abstract = "We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku =1.7× 105 erg/ cm3, which is consistent with Kshape =1.1× 105 erg/ cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.",

author = "Fang, \{Ya Peng\} and Wei He and Liustm, \{Hao Liang\} and Zhan, \{Qing Feng\} and Du, \{Hai Feng\} and Qiong Wu and Yang, \{Hai Tao\} and Zhang, \{Xiang Qun\} and Cheng, \{Zhao Hua\}",

year = "2010",

month = jul,

day = "12",

doi = "10.1063/1.3463458",

language = "英语",

volume = "97",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "2",

}

TY - JOUR

T1 - Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

AU - Fang, Ya Peng

AU - He, Wei

AU - Liustm, Hao Liang

AU - Zhan, Qing Feng

AU - Du, Hai Feng

AU - Wu, Qiong

AU - Yang, Hai Tao

AU - Zhang, Xiang Qun

AU - Cheng, Zhao Hua

PY - 2010/7/12

Y1 - 2010/7/12

N2 - We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku =1.7× 105 erg/ cm3, which is consistent with Kshape =1.1× 105 erg/ cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.

AB - We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku =1.7× 105 erg/ cm3, which is consistent with Kshape =1.1× 105 erg/ cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.

UR - https://www.scopus.com/pages/publications/77955149493

U2 - 10.1063/1.3463458

DO - 10.1063/1.3463458

M3 - 文章

AN - SCOPUS:77955149493

SN - 0003-6951

VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 2

M1 - 022507

ER -

Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Abstract

Access to Document

Other files and links

Fingerprint

Cite this