Abstract
LaNiO3 thin films on Si (l00) substrates were prepared by chemical solution decomposition. The effects of annealing atmosphere (air and oxygen) on the crystallinity, grain size and resistivity of thin films, and the PZT films grown on the LNO layers were studied. The results show that the value of resistivity of the thin films annealed in oxygen is only half of that obtained in air. The conductive mechanism of the thin films was discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 269-272 |
| Number of pages | 4 |
| Journal | Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves |
| Volume | 22 |
| Issue number | 4 |
| State | Published - Aug 2003 |
| Externally published | Yes |
Keywords
- Annealing atmosphere
- Chemical solution decomposition
- LaNiO thin films
- Resistivity