Study on the preparation of LaNiO3 thin films using chemical solution decomposition method

Ya Wei Li*, Xiang Jian Meng, Jian Yu, Gen Shui Wang, Jing Lan Sun, Jun Hao Chu, Wei Feng Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

LaNiO3 thin films on Si (l00) substrates were prepared by chemical solution decomposition. The effects of annealing atmosphere (air and oxygen) on the crystallinity, grain size and resistivity of thin films, and the PZT films grown on the LNO layers were studied. The results show that the value of resistivity of the thin films annealed in oxygen is only half of that obtained in air. The conductive mechanism of the thin films was discussed.

Original languageEnglish
Pages (from-to)269-272
Number of pages4
JournalHongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves
Volume22
Issue number4
StatePublished - Aug 2003
Externally publishedYes

Keywords

  • Annealing atmosphere
  • Chemical solution decomposition
  • LaNiO thin films
  • Resistivity

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