Study on the composition dependence of IR spectra on La-Ni-O thin films

Qiang Zhao; Zhi Gao Hu; Zhi Ming Huang; Gen Shui Wang; Jun Hao Chu

Study on the composition dependence of IR spectra on La-Ni-O thin films

Qiang Zhao^*
, Zhi Gao Hu
, Zhi Ming Huang
, Gen Shui Wang
, Jun Hao Chu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

La-Ni-O thin films of different La and Ni concentration ratios were deposited on (111)Si at a substrate temperature of 260°C by a rf-magnetron sputtering system with a combined target. The optical refractive index and extinction coefficient were derived by simultaneously fitting the transmittance and reflectance spectra in the wavelength region of 2-12.5μm. And they increase with the increase of wavelength and change significantly with different composition. The film is of amorphous structure when La content is too high. The film is with (100) preferred orientation and metallic electric conduction as the atomic concentration ratio of La to Ni is less than 1.44:1. With the stoichiometric composition (Ni:La=1:1), the lattice constant and sheet resistivity of the film reach minimum. A practicable explanation for all experimental results is developed according to the conducting mechanism of LaNiO₃.

Original language	English
Pages (from-to)	95-98
Number of pages	4
Journal	Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves
Volume	23
Issue number	2
State	Published - Apr 2004
Externally published	Yes

Keywords

Electric conductivity
LaNiO film
Lattice constant
Optical properties

Cite this

@article{b10b2181398b4ceb9743737106cb1c80,

title = "Study on the composition dependence of IR spectra on La-Ni-O thin films",

abstract = "La-Ni-O thin films of different La and Ni concentration ratios were deposited on (111)Si at a substrate temperature of 260°C by a rf-magnetron sputtering system with a combined target. The optical refractive index and extinction coefficient were derived by simultaneously fitting the transmittance and reflectance spectra in the wavelength region of 2-12.5μm. And they increase with the increase of wavelength and change significantly with different composition. The film is of amorphous structure when La content is too high. The film is with (100) preferred orientation and metallic electric conduction as the atomic concentration ratio of La to Ni is less than 1.44:1. With the stoichiometric composition (Ni:La=1:1), the lattice constant and sheet resistivity of the film reach minimum. A practicable explanation for all experimental results is developed according to the conducting mechanism of LaNiO3.",

keywords = "Electric conductivity, LaNiO film, Lattice constant, Optical properties",

author = "Qiang Zhao and Hu, \{Zhi Gao\} and Huang, \{Zhi Ming\} and Wang, \{Gen Shui\} and Chu, \{Jun Hao\}",

year = "2004",

month = apr,

language = "英语",

volume = "23",

pages = "95--98",

journal = "Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves",

issn = "1001-9014",

publisher = "Chinese Optical Society",

number = "2",

}

TY - JOUR

T1 - Study on the composition dependence of IR spectra on La-Ni-O thin films

AU - Zhao, Qiang

AU - Hu, Zhi Gao

AU - Huang, Zhi Ming

AU - Wang, Gen Shui

AU - Chu, Jun Hao

PY - 2004/4

Y1 - 2004/4

N2 - La-Ni-O thin films of different La and Ni concentration ratios were deposited on (111)Si at a substrate temperature of 260°C by a rf-magnetron sputtering system with a combined target. The optical refractive index and extinction coefficient were derived by simultaneously fitting the transmittance and reflectance spectra in the wavelength region of 2-12.5μm. And they increase with the increase of wavelength and change significantly with different composition. The film is of amorphous structure when La content is too high. The film is with (100) preferred orientation and metallic electric conduction as the atomic concentration ratio of La to Ni is less than 1.44:1. With the stoichiometric composition (Ni:La=1:1), the lattice constant and sheet resistivity of the film reach minimum. A practicable explanation for all experimental results is developed according to the conducting mechanism of LaNiO3.

AB - La-Ni-O thin films of different La and Ni concentration ratios were deposited on (111)Si at a substrate temperature of 260°C by a rf-magnetron sputtering system with a combined target. The optical refractive index and extinction coefficient were derived by simultaneously fitting the transmittance and reflectance spectra in the wavelength region of 2-12.5μm. And they increase with the increase of wavelength and change significantly with different composition. The film is of amorphous structure when La content is too high. The film is with (100) preferred orientation and metallic electric conduction as the atomic concentration ratio of La to Ni is less than 1.44:1. With the stoichiometric composition (Ni:La=1:1), the lattice constant and sheet resistivity of the film reach minimum. A practicable explanation for all experimental results is developed according to the conducting mechanism of LaNiO3.

KW - Electric conductivity

KW - LaNiO film

KW - Lattice constant

KW - Optical properties

UR - https://www.scopus.com/pages/publications/3142637158

M3 - 文章

AN - SCOPUS:3142637158

SN - 1001-9014

VL - 23

SP - 95

EP - 98

JO - Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves

JF - Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves

IS - 2

ER -

Study on the composition dependence of IR spectra on La-Ni-O thin films

Abstract

Keywords

Other files and links

Fingerprint

Cite this