Study of optical characteristics of damage in oxygen-implanted 6H-SiC

Lianwei Wang; Jipo Huang; Chenglu Lin; Shichang Zou; Yuxiang Zheng; Xinjun Wang; Daming Huang; C. M. Zetterling; M. Östling

doi:10.1023/A:1006627610829

Study of optical characteristics of damage in oxygen-implanted 6H-SiC

Lianwei Wang, Jipo Huang, Chenglu Lin, Shichang Zou, Yuxiang Zheng, Xinjun Wang, Daming Huang, C. M. Zetterling, M. Östling

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Oxygen ions, with an energy of 70 keV, and doses ranging from 5×10¹³ to 5×10¹⁵ cm^-2, were implanted into 6H SiC. The damage energies were calculated as 0.93-93 eV/atom with the doses respectively. The dielectric function obtained from spectroscopic ellipsometry were quite sensitive to ion irradiation of the surface, while the first order Raman spectroscopy decreased in intensity with increasing O⁺ ion dose. The damage behavior characterized by optical measurements was in good agreement with characterization by Rutherford backscattering spectrometry and channeling and atomic force microscopy.

Original language	English
Pages (from-to)	979-982
Number of pages	4
Journal	Journal of Materials Science Letters
Volume	18
Issue number	12
DOIs	https://doi.org/10.1023/A:1006627610829
State	Published - 1999
Externally published	Yes

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@article{a50224d13ccf4e0da772397c5e0cc5c6,

title = "Study of optical characteristics of damage in oxygen-implanted 6H-SiC",

abstract = "Oxygen ions, with an energy of 70 keV, and doses ranging from 5×1013 to 5×1015 cm-2, were implanted into 6H SiC. The damage energies were calculated as 0.93-93 eV/atom with the doses respectively. The dielectric function obtained from spectroscopic ellipsometry were quite sensitive to ion irradiation of the surface, while the first order Raman spectroscopy decreased in intensity with increasing O+ ion dose. The damage behavior characterized by optical measurements was in good agreement with characterization by Rutherford backscattering spectrometry and channeling and atomic force microscopy.",

author = "Lianwei Wang and Jipo Huang and Chenglu Lin and Shichang Zou and Yuxiang Zheng and Xinjun Wang and Daming Huang and Zetterling, \{C. M.\} and M. {\"O}stling",

year = "1999",

doi = "10.1023/A:1006627610829",

language = "英语",

volume = "18",

pages = "979--982",

journal = "Journal of Materials Science Letters",

issn = "0261-8028",

publisher = "Chapman \& Hall",

number = "12",

}

TY - JOUR

T1 - Study of optical characteristics of damage in oxygen-implanted 6H-SiC

AU - Wang, Lianwei

AU - Huang, Jipo

AU - Lin, Chenglu

AU - Zou, Shichang

AU - Zheng, Yuxiang

AU - Wang, Xinjun

AU - Huang, Daming

AU - Zetterling, C. M.

AU - Östling, M.

PY - 1999

Y1 - 1999

N2 - Oxygen ions, with an energy of 70 keV, and doses ranging from 5×1013 to 5×1015 cm-2, were implanted into 6H SiC. The damage energies were calculated as 0.93-93 eV/atom with the doses respectively. The dielectric function obtained from spectroscopic ellipsometry were quite sensitive to ion irradiation of the surface, while the first order Raman spectroscopy decreased in intensity with increasing O+ ion dose. The damage behavior characterized by optical measurements was in good agreement with characterization by Rutherford backscattering spectrometry and channeling and atomic force microscopy.

AB - Oxygen ions, with an energy of 70 keV, and doses ranging from 5×1013 to 5×1015 cm-2, were implanted into 6H SiC. The damage energies were calculated as 0.93-93 eV/atom with the doses respectively. The dielectric function obtained from spectroscopic ellipsometry were quite sensitive to ion irradiation of the surface, while the first order Raman spectroscopy decreased in intensity with increasing O+ ion dose. The damage behavior characterized by optical measurements was in good agreement with characterization by Rutherford backscattering spectrometry and channeling and atomic force microscopy.

UR - https://www.scopus.com/pages/publications/0032635162

U2 - 10.1023/A:1006627610829

DO - 10.1023/A:1006627610829

M3 - 文章

AN - SCOPUS:0032635162

SN - 0261-8028

VL - 18

SP - 979

EP - 982

JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 12

ER -

Study of optical characteristics of damage in oxygen-implanted 6H-SiC

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