Structure change of poly(vinylidene fluoride-trifluoroethylene) ferroelectric thin films on different electrodes

P. F. Liu; X. J. Meng; J. L. Wang; J. H. Chu; P. Gemeiner; S. Geiger; B. Dkhil

doi:10.1080/00150193.2010.483198

Structure change of poly(vinylidene fluoride-trifluoroethylene) ferroelectric thin films on different electrodes

P. F. Liu
, X. J. Meng
, J. L. Wang
, J. H. Chu
, P. Gemeiner
, S. Geiger
, B. Dkhil

Research output: Contribution to journal › Article › peer-review

Abstract

In this work we studied 65nm-thick poly(vinylidene fluoride- trifluoroethylene) ferroelectric polymers P(VDF-TrFE) films grown by Langmuir-Blodgett (LB) onto silicon substrates. The effects of two different bottom electrodes namely Al and LaNiO₃ (LNO) are investigated. Temperature dependence of dielectric constant shows that the film grown on the Al has a better dielectric response. X-ray diffraction indicates that more defects or gauche segments exist in film on LNO, which lead to deterioration of dielectric property.

Original language	English
Pages (from-to)	183-187
Number of pages	5
Journal	Ferroelectrics
Volume	405
Issue number	1
DOIs	https://doi.org/10.1080/00150193.2010.483198
State	Published - 2010
Externally published	Yes

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title = "Structure change of poly(vinylidene fluoride-trifluoroethylene) ferroelectric thin films on different electrodes",

abstract = "In this work we studied 65nm-thick poly(vinylidene fluoride- trifluoroethylene) ferroelectric polymers P(VDF-TrFE) films grown by Langmuir-Blodgett (LB) onto silicon substrates. The effects of two different bottom electrodes namely Al and LaNiO3 (LNO) are investigated. Temperature dependence of dielectric constant shows that the film grown on the Al has a better dielectric response. X-ray diffraction indicates that more defects or gauche segments exist in film on LNO, which lead to deterioration of dielectric property.",

author = "Liu, \{P. F.\} and Meng, \{X. J.\} and Wang, \{J. L.\} and Chu, \{J. H.\} and P. Gemeiner and S. Geiger and B. Dkhil",

year = "2010",

doi = "10.1080/00150193.2010.483198",

language = "英语",

volume = "405",

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T1 - Structure change of poly(vinylidene fluoride-trifluoroethylene) ferroelectric thin films on different electrodes

AU - Liu, P. F.

AU - Meng, X. J.

AU - Wang, J. L.

AU - Chu, J. H.

AU - Gemeiner, P.

AU - Geiger, S.

AU - Dkhil, B.

PY - 2010

Y1 - 2010

N2 - In this work we studied 65nm-thick poly(vinylidene fluoride- trifluoroethylene) ferroelectric polymers P(VDF-TrFE) films grown by Langmuir-Blodgett (LB) onto silicon substrates. The effects of two different bottom electrodes namely Al and LaNiO3 (LNO) are investigated. Temperature dependence of dielectric constant shows that the film grown on the Al has a better dielectric response. X-ray diffraction indicates that more defects or gauche segments exist in film on LNO, which lead to deterioration of dielectric property.

AB - In this work we studied 65nm-thick poly(vinylidene fluoride- trifluoroethylene) ferroelectric polymers P(VDF-TrFE) films grown by Langmuir-Blodgett (LB) onto silicon substrates. The effects of two different bottom electrodes namely Al and LaNiO3 (LNO) are investigated. Temperature dependence of dielectric constant shows that the film grown on the Al has a better dielectric response. X-ray diffraction indicates that more defects or gauche segments exist in film on LNO, which lead to deterioration of dielectric property.

UR - https://www.scopus.com/pages/publications/79955700472

U2 - 10.1080/00150193.2010.483198

DO - 10.1080/00150193.2010.483198

M3 - 文章

AN - SCOPUS:79955700472

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VL - 405

SP - 183

EP - 187

JO - Ferroelectrics

JF - Ferroelectrics

IS - 1

ER -

Structure change of poly(vinylidene fluoride-trifluoroethylene) ferroelectric thin films on different electrodes

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