Abstract
The adsorption/desorption of H+ and OH- ions under static conditions on to alumina in aqueous NaNO3 solution was studied at 30°C by potentiometric titration and calculations undertaken using the triple layer model (TLM). Intrinsic dissociation constants and intrinsic complexation constants at 30°C were used to calculate surface charge density, surface potential and surface species as a function of pH and ionic strength (I). Related adsorption/desorption studies of H+ and OH ions under dynamic conditions on to alumina in aqueous NaNO3 solution were studied by means of the concentration-jump technique. Mechanistic information regarding H+ and OH- ion adsorption/desorption on to alumina was discussed using the experimental data in conjunction with the TLM.
| Original language | English |
|---|---|
| Pages (from-to) | 349-359 |
| Number of pages | 11 |
| Journal | Adsorption Science and Technology |
| Volume | 15 |
| Issue number | 5 |
| DOIs | |
| State | Published - 1997 |
| Externally published | Yes |