Single crystalline InAsxSb1-x grown on (100) InSb substrate by liquid phase epitaxy

  • Changhong Sun
  • , Shuhong Hu
  • , Qiwei Wang
  • , Feng Qiu
  • , Yingfei Lv
  • , Huiyong Deng
  • , Yan Sun
  • , Ning Dai*
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Single crystalline InAs0.016Sb0.984 film has been successfully grown on (100) InSb substrate by LPE method. A large supercooling (ΔT = 15 °C) had been used to prevent substrate from dissolving into the epilayer. High resolution X-ray diffraction (HRXRD) measurement was used to characterize the crystal quality of the film. Only (200) and (400) peaks were observed from the XRD spectrum, indicating that the film was single crystalline with (100) orientation. The Fourier transform infrared (FTIR) transmission spectrum of the film at room temperature revealed 7.77 μm cut-off wavelength of the film. The lattice dynamics of the epilayer was studied by Raman scattering, suggests two-mode behavior of the optical phonons.

Original languageEnglish
Title of host publication6th International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationOptoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy
DOIs
StatePublished - 2012
Externally publishedYes
Event6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy - Xiamen, China
Duration: 26 Apr 201229 Apr 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8419
ISSN (Print)0277-786X

Conference

Conference6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy
Country/TerritoryChina
CityXiamen
Period26/04/1229/04/12

Keywords

  • InAsSb
  • Liquid phase epitaxy
  • Single crystal

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