PZT thin films prepared by chemical solution decomposition using a Bi2Ti2O7 buffer layer

  • Shao Wei Wang*
  • , Hong Wang
  • , Shu Xia Shang
  • , Ji Huang
  • , Zhuo Wang
  • , Min Wang
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

A thin-film bilayer structure consisting of polycrystalline Pb(Zr0.5Ti0.5)O3 (PZT) and preferentially (111)-orientated Bi2Ti2O7 were prepared using the chemical solution decomposition (CSD) technique followed by rapid thermal annealing (RTA). The effects of various annealing temperatures and times upon crystallization were investigated. The C-V and dielectric characteristics were measured. The PZT films annealed at 750°C for 10 min consist of a single perovskite phase. The value of leakage current density at 9 V is 3.79 × 10-7 A/cm2. The counterclockwise hysteresis curve observed shows that it is polarization-type switching. The PZT/Bi2Ti2O7 film in the ON and OFF states is relatively stable.

Original languageEnglish
Pages (from-to)388-392
Number of pages5
JournalJournal of Crystal Growth
Volume217
Issue number4
DOIs
StatePublished - 2 Aug 2000
Externally publishedYes

Keywords

  • Chemical solution decomposition
  • PZT/BiTiO films
  • X-ray diffraction

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