Pulsed laser deposition of pyroelectric PCLT thin films using a ceramic/metal target

Lirong Zheng; Pingxiong Yang; W. Ping Xu; Chenglu Lin; Wenbiao Wu; Masanori Okuyama

doi:10.1080/10584589808238770

Pulsed laser deposition of pyroelectric PCLT thin films using a ceramic/metal target

Lirong Zheng^*
, Pingxiong Yang
, W. Ping Xu
, Chenglu Lin
, Wenbiao Wu
, Masanori Okuyama

^*Corresponding author for this work

CAS - Shanghai Institute of Microsystem and Information Technology
The University of Osaka

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

In this paper, we report the preparation and characteristics of Ca and La doped PbTiC₃ (PCLT) thin film on Pt/Ti/SiO₂/Si substrate by laser ablating a ceramic/metal target. The deposited film is polycrystalline and exhibits good ferroelectric hysteresis loop, low leakage, and good pyroelectric properties. The pyroelectric coefficient of the film is high as 8.81 × 10^-8 C/cm²K and the effective dielectric constant of the film is about 352. So the figure of merit of the film is high as 0.78×10^-10 Ccm/J, indicating that PCLT is a promising material for pyroelectric application.

Original language	English
Pages (from-to)	73-78
Number of pages	6
Journal	Integrated Ferroelectrics
Volume	20
Issue number	1-4
DOIs	https://doi.org/10.1080/10584589808238770
State	Published - 1998
Externally published	Yes

Keywords

Ceramic/metal target
Pulsed laser deposition
Pyroelectric thin film

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10.1080/10584589808238770

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title = "Pulsed laser deposition of pyroelectric PCLT thin films using a ceramic/metal target",

abstract = "In this paper, we report the preparation and characteristics of Ca and La doped PbTiC3 (PCLT) thin film on Pt/Ti/SiO2/Si substrate by laser ablating a ceramic/metal target. The deposited film is polycrystalline and exhibits good ferroelectric hysteresis loop, low leakage, and good pyroelectric properties. The pyroelectric coefficient of the film is high as 8.81 × 10-8 C/cm2K and the effective dielectric constant of the film is about 352. So the figure of merit of the film is high as 0.78×10-10 Ccm/J, indicating that PCLT is a promising material for pyroelectric application.",

keywords = "Ceramic/metal target, Pulsed laser deposition, Pyroelectric thin film",

author = "Lirong Zheng and Pingxiong Yang and Xu, \{W. Ping\} and Chenglu Lin and Wenbiao Wu and Masanori Okuyama",

year = "1998",

doi = "10.1080/10584589808238770",

language = "英语",

volume = "20",

pages = "73--78",

journal = "Integrated Ferroelectrics",

issn = "1058-4587",

publisher = "Taylor and Francis Ltd.",

number = "1-4",

}

TY - JOUR

T1 - Pulsed laser deposition of pyroelectric PCLT thin films using a ceramic/metal target

AU - Zheng, Lirong

AU - Yang, Pingxiong

AU - Xu, W. Ping

AU - Lin, Chenglu

AU - Wu, Wenbiao

AU - Okuyama, Masanori

PY - 1998

Y1 - 1998

N2 - In this paper, we report the preparation and characteristics of Ca and La doped PbTiC3 (PCLT) thin film on Pt/Ti/SiO2/Si substrate by laser ablating a ceramic/metal target. The deposited film is polycrystalline and exhibits good ferroelectric hysteresis loop, low leakage, and good pyroelectric properties. The pyroelectric coefficient of the film is high as 8.81 × 10-8 C/cm2K and the effective dielectric constant of the film is about 352. So the figure of merit of the film is high as 0.78×10-10 Ccm/J, indicating that PCLT is a promising material for pyroelectric application.

AB - In this paper, we report the preparation and characteristics of Ca and La doped PbTiC3 (PCLT) thin film on Pt/Ti/SiO2/Si substrate by laser ablating a ceramic/metal target. The deposited film is polycrystalline and exhibits good ferroelectric hysteresis loop, low leakage, and good pyroelectric properties. The pyroelectric coefficient of the film is high as 8.81 × 10-8 C/cm2K and the effective dielectric constant of the film is about 352. So the figure of merit of the film is high as 0.78×10-10 Ccm/J, indicating that PCLT is a promising material for pyroelectric application.

KW - Ceramic/metal target

KW - Pulsed laser deposition

KW - Pyroelectric thin film

UR - https://www.scopus.com/pages/publications/0032316571

U2 - 10.1080/10584589808238770

DO - 10.1080/10584589808238770

M3 - 文章

AN - SCOPUS:0032316571

SN - 1058-4587

VL - 20

SP - 73

EP - 78

JO - Integrated Ferroelectrics

JF - Integrated Ferroelectrics

IS - 1-4

ER -

Pulsed laser deposition of pyroelectric PCLT thin films using a ceramic/metal target

Abstract

Keywords

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