TY - JOUR
T1 - Processing parameters and property of AZO thin film prepared by magnetron sputtering
AU - Kong, Hui
AU - Yang, Pingxiong
AU - Chu, Junhao
PY - 2011
Y1 - 2011
N2 - As we all know, transparent and conductive Al:ZnO (AZO) films are being considered for manufacturing transparent electrodes in flat panel displays, solar cells and organic light emitting diodes due to their high electro optical quality, high material availability and low material cost for large area applications. In this experiment, AZO thin films were prepared on glass substrate by Magnetron Sputtering method with a 2wt % Al -doped ceramic target .The processing parameters on electrical properties of AZO thin film were investigated. When processing pressure is 0.8Pa,the sputtering power is 225W,the temperature of substrate is 225°, the AZO thin films have a lowest resistivity of 9.81×10-4 Ω.cm and visible light transmittance of more than 85%.
AB - As we all know, transparent and conductive Al:ZnO (AZO) films are being considered for manufacturing transparent electrodes in flat panel displays, solar cells and organic light emitting diodes due to their high electro optical quality, high material availability and low material cost for large area applications. In this experiment, AZO thin films were prepared on glass substrate by Magnetron Sputtering method with a 2wt % Al -doped ceramic target .The processing parameters on electrical properties of AZO thin film were investigated. When processing pressure is 0.8Pa,the sputtering power is 225W,the temperature of substrate is 225°, the AZO thin films have a lowest resistivity of 9.81×10-4 Ω.cm and visible light transmittance of more than 85%.
UR - https://www.scopus.com/pages/publications/79953842385
U2 - 10.1088/1742-6596/276/1/012170
DO - 10.1088/1742-6596/276/1/012170
M3 - 文章
AN - SCOPUS:79953842385
SN - 1742-6588
VL - 276
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
IS - 1
M1 - 012170
ER -