TY - JOUR
T1 - Probe inducing surface plasmon resonance nanolithographic system
AU - Zhao, Chengqiang
AU - Xu, Wendong
AU - Hong, Xiaogang
AU - Li, Xiaogang
AU - Tang, Xiaodong
PY - 2009/2
Y1 - 2009/2
N2 - A probe inducing surface plasmon resonance nanolithographic (PSPRN) system is introduced, which is constructed based on an atomic force microscope (AFM). Not only this system has realized accurate control of the probe, but the system itself has the complete function of AFM, it may examine surface appearance of the sample and the lithography effect in real time. The advanced Kretschmann resonance coupled device with index-matching oil between the prism and the substrate is used in this system, which makes the replacement of samples easier. Acousto-optic modulator combined with AFM is adopted to realize the accurate control of the irradiation time of plasma-excited laser. In preliminary experiment, lithographic spots with about 100 nm in diameter are obtained on silver film, which has confirmed the feasibility of PSPRN. The effects of illumination time, laser power, material thickness, laser incident angle etc. on size and depth of lithography spots are studied, which provide reference for the realization of smaller lithographic spots.
AB - A probe inducing surface plasmon resonance nanolithographic (PSPRN) system is introduced, which is constructed based on an atomic force microscope (AFM). Not only this system has realized accurate control of the probe, but the system itself has the complete function of AFM, it may examine surface appearance of the sample and the lithography effect in real time. The advanced Kretschmann resonance coupled device with index-matching oil between the prism and the substrate is used in this system, which makes the replacement of samples easier. Acousto-optic modulator combined with AFM is adopted to realize the accurate control of the irradiation time of plasma-excited laser. In preliminary experiment, lithographic spots with about 100 nm in diameter are obtained on silver film, which has confirmed the feasibility of PSPRN. The effects of illumination time, laser power, material thickness, laser incident angle etc. on size and depth of lithography spots are studied, which provide reference for the realization of smaller lithographic spots.
KW - Atomic force microscope (AFM)
KW - Lithography
KW - Probe
KW - Surface plasmon resonance (SPR)
UR - https://www.scopus.com/pages/publications/61749093002
U2 - 10.3788/AOS20092902.0473
DO - 10.3788/AOS20092902.0473
M3 - 文章
AN - SCOPUS:61749093002
SN - 0253-2239
VL - 29
SP - 473
EP - 477
JO - Guangxue Xuebao/Acta Optica Sinica
JF - Guangxue Xuebao/Acta Optica Sinica
IS - 2
ER -