Preparation of thick GeO2 glass film with high UV photosensitivity

Chengbin Jing; Haiyang Shan; Chuanjian Zhang; Junhao Chu

doi:10.1016/j.jnoncrysol.2010.09.016

Preparation of thick GeO₂ glass film with high UV photosensitivity

Chengbin Jing^*
, Haiyang Shan
, Chuanjian Zhang
, Junhao Chu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Hexagonal GeO₂ ceramic films were fabricated at room temperature via an acid induced liquid phase deposition (LPD) method. Thick GeO₂ glass films were prepared using a melting and quick cooling technique. The glass films were annealed in a mixed hydrogen/nitrogen gas atmosphere to create more oxygen vacancies. The intensity of 5-eV absorption band enhances with increase of annealing temperature as well as time. The activation energy of oxygen vacancy formation is calculated to be 0.91 ± 0.05 eV. The 5-eV absorption band is photobleachable, and the saturated absorptivity change reaches 575 ± 17 cm^{- 1}.

Original language	English
Pages (from-to)	2884-2888
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	356
Issue number	50-51
DOIs	https://doi.org/10.1016/j.jnoncrysol.2010.09.016
State	Published - Nov 2010
Externally published	Yes

Keywords

5-eV absorption band
Activation energy
Thick GeO glass film
UV photosensitivity

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10.1016/j.jnoncrysol.2010.09.016

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@article{48b17ff88714411691858f114737fa80,

title = "Preparation of thick GeO2 glass film with high UV photosensitivity",

abstract = "Hexagonal GeO2 ceramic films were fabricated at room temperature via an acid induced liquid phase deposition (LPD) method. Thick GeO2 glass films were prepared using a melting and quick cooling technique. The glass films were annealed in a mixed hydrogen/nitrogen gas atmosphere to create more oxygen vacancies. The intensity of 5-eV absorption band enhances with increase of annealing temperature as well as time. The activation energy of oxygen vacancy formation is calculated to be 0.91 ± 0.05 eV. The 5-eV absorption band is photobleachable, and the saturated absorptivity change reaches 575 ± 17 cm- 1.",

keywords = "5-eV absorption band, Activation energy, Thick GeO glass film, UV photosensitivity",

author = "Chengbin Jing and Haiyang Shan and Chuanjian Zhang and Junhao Chu",

year = "2010",

month = nov,

doi = "10.1016/j.jnoncrysol.2010.09.016",

language = "英语",

volume = "356",

pages = "2884--2888",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier B.V.",

number = "50-51",

}

TY - JOUR

T1 - Preparation of thick GeO2 glass film with high UV photosensitivity

AU - Jing, Chengbin

AU - Shan, Haiyang

AU - Zhang, Chuanjian

AU - Chu, Junhao

PY - 2010/11

Y1 - 2010/11

N2 - Hexagonal GeO2 ceramic films were fabricated at room temperature via an acid induced liquid phase deposition (LPD) method. Thick GeO2 glass films were prepared using a melting and quick cooling technique. The glass films were annealed in a mixed hydrogen/nitrogen gas atmosphere to create more oxygen vacancies. The intensity of 5-eV absorption band enhances with increase of annealing temperature as well as time. The activation energy of oxygen vacancy formation is calculated to be 0.91 ± 0.05 eV. The 5-eV absorption band is photobleachable, and the saturated absorptivity change reaches 575 ± 17 cm- 1.

AB - Hexagonal GeO2 ceramic films were fabricated at room temperature via an acid induced liquid phase deposition (LPD) method. Thick GeO2 glass films were prepared using a melting and quick cooling technique. The glass films were annealed in a mixed hydrogen/nitrogen gas atmosphere to create more oxygen vacancies. The intensity of 5-eV absorption band enhances with increase of annealing temperature as well as time. The activation energy of oxygen vacancy formation is calculated to be 0.91 ± 0.05 eV. The 5-eV absorption band is photobleachable, and the saturated absorptivity change reaches 575 ± 17 cm- 1.

KW - 5-eV absorption band

KW - Activation energy

KW - Thick GeO glass film

KW - UV photosensitivity

UR - https://www.scopus.com/pages/publications/78449247804

U2 - 10.1016/j.jnoncrysol.2010.09.016

DO - 10.1016/j.jnoncrysol.2010.09.016

M3 - 文章

AN - SCOPUS:78449247804

SN - 0022-3093

VL - 356

SP - 2884

EP - 2888

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - 50-51

ER -

Preparation of thick GeO₂ glass film with high UV photosensitivity

Abstract

Keywords

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