TY - JOUR
T1 - Preparation of mesoporous silica films using sol-gel process and argon plasma treatment
AU - Palaniappan, Alagappan
AU - Zhang, Jian
AU - Su, Xiaodi
AU - Tay, Francis E.H.
PY - 2004/9/1
Y1 - 2004/9/1
N2 - This Letter demonstrates the first attempt of using sol-gel technique in combination with argon plasma calcination for the preparation of mesoporous silica films. CTAB is used as an organic template to generate the porous structure upon removal by the argon plasma treatment. Field emission scanning electron microscope, Fourier transform infrared spectroscopy, small angle X-ray scattering, N 2-sorption experiment and nanoindentation technique are used for characterization. Results show that the obtained films have identical chemical structure and comparable mechanical properties with those prepared using thermal calcination. The plasma parameters have distinct influences on the thickness and mesoporous property of the films.
AB - This Letter demonstrates the first attempt of using sol-gel technique in combination with argon plasma calcination for the preparation of mesoporous silica films. CTAB is used as an organic template to generate the porous structure upon removal by the argon plasma treatment. Field emission scanning electron microscope, Fourier transform infrared spectroscopy, small angle X-ray scattering, N 2-sorption experiment and nanoindentation technique are used for characterization. Results show that the obtained films have identical chemical structure and comparable mechanical properties with those prepared using thermal calcination. The plasma parameters have distinct influences on the thickness and mesoporous property of the films.
UR - https://www.scopus.com/pages/publications/4344648018
U2 - 10.1016/j.cplett.2004.07.060
DO - 10.1016/j.cplett.2004.07.060
M3 - 文章
AN - SCOPUS:4344648018
SN - 0009-2614
VL - 395
SP - 70
EP - 74
JO - Chemical Physics Letters
JF - Chemical Physics Letters
IS - 1-3
ER -