Preparation of high thermal stability MCM-41 in the low surfactant/silicon molar ratio synthesis systems

J. Yu; J. L. Shi; L. Z. Wang; M. L. Ruan; D. S. Yan

doi:10.1023/A:1006770228512

Preparation of high thermal stability MCM-41 in the low surfactant/silicon molar ratio synthesis systems

J. Yu^*
, J. L. Shi
, L. Z. Wang
, M. L. Ruan
, D. S. Yan

^*Corresponding author for this work

CAS - Shanghai Institute of Ceramics

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Low surfactant/silicon molar ratio synthesis systems were investigated for the preparation of a high thermal stability mesoporous molecular sieve MCM-41. Tetraethyl orthosilicate containing cetyltrimethylammonium bromide (CTAB) and NaOH were used to prepare synthesis gel which was analyzed by XRD diffractograms and N₂ adsorption isotherms. The XRD patterns exhibited high-intensity peaks.

Original language	English
Pages (from-to)	289-291
Number of pages	3
Journal	Journal of Materials Science Letters
Volume	20
Issue number	3
DOIs	https://doi.org/10.1023/A:1006770228512
State	Published - 1 Feb 2001
Externally published	Yes

Access to Document

10.1023/A:1006770228512

Cite this

@article{4efcd6be76c4416fa90a2d7e7d937258,

title = "Preparation of high thermal stability MCM-41 in the low surfactant/silicon molar ratio synthesis systems",

abstract = "Low surfactant/silicon molar ratio synthesis systems were investigated for the preparation of a high thermal stability mesoporous molecular sieve MCM-41. Tetraethyl orthosilicate containing cetyltrimethylammonium bromide (CTAB) and NaOH were used to prepare synthesis gel which was analyzed by XRD diffractograms and N2 adsorption isotherms. The XRD patterns exhibited high-intensity peaks.",

author = "J. Yu and Shi, \{J. L.\} and Wang, \{L. Z.\} and Ruan, \{M. L.\} and Yan, \{D. S.\}",

year = "2001",

month = feb,

day = "1",

doi = "10.1023/A:1006770228512",

language = "英语",

volume = "20",

pages = "289--291",

journal = "Journal of Materials Science Letters",

issn = "0261-8028",

publisher = "Chapman \& Hall",

number = "3",

}

TY - JOUR

T1 - Preparation of high thermal stability MCM-41 in the low surfactant/silicon molar ratio synthesis systems

AU - Yu, J.

AU - Shi, J. L.

AU - Wang, L. Z.

AU - Ruan, M. L.

AU - Yan, D. S.

PY - 2001/2/1

Y1 - 2001/2/1

N2 - Low surfactant/silicon molar ratio synthesis systems were investigated for the preparation of a high thermal stability mesoporous molecular sieve MCM-41. Tetraethyl orthosilicate containing cetyltrimethylammonium bromide (CTAB) and NaOH were used to prepare synthesis gel which was analyzed by XRD diffractograms and N2 adsorption isotherms. The XRD patterns exhibited high-intensity peaks.

AB - Low surfactant/silicon molar ratio synthesis systems were investigated for the preparation of a high thermal stability mesoporous molecular sieve MCM-41. Tetraethyl orthosilicate containing cetyltrimethylammonium bromide (CTAB) and NaOH were used to prepare synthesis gel which was analyzed by XRD diffractograms and N2 adsorption isotherms. The XRD patterns exhibited high-intensity peaks.

UR - https://www.scopus.com/pages/publications/0035247271

U2 - 10.1023/A:1006770228512

DO - 10.1023/A:1006770228512

M3 - 文章

AN - SCOPUS:0035247271

SN - 0261-8028

VL - 20

SP - 289

EP - 291

JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 3

ER -

Preparation of high thermal stability MCM-41 in the low surfactant/silicon molar ratio synthesis systems

Abstract

Access to Document

Other files and links

Fingerprint

Cite this