Preferential emission into epsilon-near-zero metamaterial [Invited]

Tal Galfsky; Zheng Sun; Zubin Jacob; Vinod M. Menon

doi:10.1364/OME.5.002878

Preferential emission into epsilon-near-zero metamaterial [Invited]

Tal Galfsky, Zheng Sun, Zubin Jacob, Vinod M. Menon

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

We report the use of epsilon near zero (ENZ) metamaterial to control spontaneous emission from Zinc-Oxide (ZnO) excitons. The ENZ material consists of alternating layers of silver and alumina with subwavelength thicknesses, resulting in an effective medium where one of the components of the dielectric constant approach zero between 370nm-440nm wavelength range. Bulk ZnO with photoluminescence maximum in the ENZ regime was deposited via atomic layer deposition to obtain a smooth film with near field coupling to the ENZ metamaterial. Preferential emission from the ZnO layer into the metamaterial with suppression of forward emission by 90% in comparison to ZnO on silicon is observed. We attribute this observation to the presence of dispersionless plasmonic modes in the ENZ regime as shown by the results of theoretical modeling presented here. Integration of ENZ metamaterials with light emitters is an attractive platform for realizing a low threshold subwavelength laser.

Original language	English
Pages (from-to)	2878-2883
Number of pages	6
Journal	Optical Materials Express
Volume	5
Issue number	12
DOIs	https://doi.org/10.1364/OME.5.002878
State	Published - 2015
Externally published	Yes

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@article{424c320c46ec4ab8be9b6bafa2f23f51,

title = "Preferential emission into epsilon-near-zero metamaterial [Invited]",

abstract = "We report the use of epsilon near zero (ENZ) metamaterial to control spontaneous emission from Zinc-Oxide (ZnO) excitons. The ENZ material consists of alternating layers of silver and alumina with subwavelength thicknesses, resulting in an effective medium where one of the components of the dielectric constant approach zero between 370nm-440nm wavelength range. Bulk ZnO with photoluminescence maximum in the ENZ regime was deposited via atomic layer deposition to obtain a smooth film with near field coupling to the ENZ metamaterial. Preferential emission from the ZnO layer into the metamaterial with suppression of forward emission by 90\% in comparison to ZnO on silicon is observed. We attribute this observation to the presence of dispersionless plasmonic modes in the ENZ regime as shown by the results of theoretical modeling presented here. Integration of ENZ metamaterials with light emitters is an attractive platform for realizing a low threshold subwavelength laser.",

author = "Tal Galfsky and Zheng Sun and Zubin Jacob and Menon, \{Vinod M.\}",

note = "Publisher Copyright: {\textcopyright}2015 Optical Society of America.",

year = "2015",

doi = "10.1364/OME.5.002878",

language = "英语",

volume = "5",

pages = "2878--2883",

journal = "Optical Materials Express",

issn = "2159-3930",

publisher = "Optica Publishing Group (formerly OSA)",

number = "12",

}

TY - JOUR

T1 - Preferential emission into epsilon-near-zero metamaterial [Invited]

AU - Galfsky, Tal

AU - Sun, Zheng

AU - Jacob, Zubin

AU - Menon, Vinod M.

PY - 2015

Y1 - 2015

N2 - We report the use of epsilon near zero (ENZ) metamaterial to control spontaneous emission from Zinc-Oxide (ZnO) excitons. The ENZ material consists of alternating layers of silver and alumina with subwavelength thicknesses, resulting in an effective medium where one of the components of the dielectric constant approach zero between 370nm-440nm wavelength range. Bulk ZnO with photoluminescence maximum in the ENZ regime was deposited via atomic layer deposition to obtain a smooth film with near field coupling to the ENZ metamaterial. Preferential emission from the ZnO layer into the metamaterial with suppression of forward emission by 90% in comparison to ZnO on silicon is observed. We attribute this observation to the presence of dispersionless plasmonic modes in the ENZ regime as shown by the results of theoretical modeling presented here. Integration of ENZ metamaterials with light emitters is an attractive platform for realizing a low threshold subwavelength laser.

AB - We report the use of epsilon near zero (ENZ) metamaterial to control spontaneous emission from Zinc-Oxide (ZnO) excitons. The ENZ material consists of alternating layers of silver and alumina with subwavelength thicknesses, resulting in an effective medium where one of the components of the dielectric constant approach zero between 370nm-440nm wavelength range. Bulk ZnO with photoluminescence maximum in the ENZ regime was deposited via atomic layer deposition to obtain a smooth film with near field coupling to the ENZ metamaterial. Preferential emission from the ZnO layer into the metamaterial with suppression of forward emission by 90% in comparison to ZnO on silicon is observed. We attribute this observation to the presence of dispersionless plasmonic modes in the ENZ regime as shown by the results of theoretical modeling presented here. Integration of ENZ metamaterials with light emitters is an attractive platform for realizing a low threshold subwavelength laser.

UR - https://www.scopus.com/pages/publications/84950134947

U2 - 10.1364/OME.5.002878

DO - 10.1364/OME.5.002878

M3 - 文章

AN - SCOPUS:84950134947

SN - 2159-3930

VL - 5

SP - 2878

EP - 2883

JO - Optical Materials Express

JF - Optical Materials Express

IS - 12

ER -

Preferential emission into epsilon-near-zero metamaterial [Invited]

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