Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS

In this paper, SU-8 EPON-based photoresist (PR) polymerization optimization and its possible microfluidic and MEMS applications are reported. First, the optimization results of SU-8 under UV lithography are reported. The parameters which could have an influence on the lithography quality were chosen and optimized by a three-level, L9 orthogonal array of the Taguchi method. By optimization, the optimal parameter range and the weighted per cent of a parameter on the final results were determined. For SU-8-5 and SU-8-50, many microstructures with thicknesses of more than 100 and 500 μm and aspect ratios of more than 20 and 50 were obtained with high resolution. The optimization results show that the prebake time plays the key role in the quality, which is different from the previously published results. With the optimization results obtained, some possible applications of SU-8 were developed and demonstrated. These applications included using SU-8 as a structural material for a microfluidic system, as a micromold for electroplating, as a master for plastic hot-embossing, and even as a mask for some wet-etching processes.