Polariton lasing in a ZnO microwire above 450 K

Dan Xu; Wei Xie; Wenhui Liu; Jian Wang; Long Zhang; Yinglei Wang; Saifeng Zhang; Liaoxin Sun; Xuechu Shen; Zhanghai Chen

doi:10.1063/1.4866385

Polariton lasing in a ZnO microwire above 450 K

Dan Xu
, Wei Xie
, Wenhui Liu
, Jian Wang
, Long Zhang
, Yinglei Wang
, Saifeng Zhang
, Liaoxin Sun
, Xuechu Shen
, Zhanghai Chen^*

^*Corresponding author for this work

Fudan University

Research output: Contribution to journal › Article › peer-review

44 Scopus citations

Abstract

Exciton-polariton lasing in a one-dimensional ZnO microcavity is demonstrated at high temperature of 455 K. The massive occupation of the polariton ground state above a distinct pump power threshold is clearly demonstrated by using the angular resolved spectroscopy under non-resonant excitation. The temperature dependence of the polariton lasing threshold is well interpreted by two competing mechanisms, i.e., the thermodynamic and kinetic mechanisms. Michelson interference measurements are performed to investigate the temporal and spatial coherence of polariton laser, with the coherence time and coherence length being τc∼0.97 ps and rc∼0.72μm at 440 K and 400 K, respectively.

Original language	English
Article number	082101
Journal	Applied Physics Letters
Volume	104
Issue number	8
DOIs	https://doi.org/10.1063/1.4866385
State	Published - 24 Feb 2014
Externally published	Yes

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title = "Polariton lasing in a ZnO microwire above 450 K",

abstract = "Exciton-polariton lasing in a one-dimensional ZnO microcavity is demonstrated at high temperature of 455 K. The massive occupation of the polariton ground state above a distinct pump power threshold is clearly demonstrated by using the angular resolved spectroscopy under non-resonant excitation. The temperature dependence of the polariton lasing threshold is well interpreted by two competing mechanisms, i.e., the thermodynamic and kinetic mechanisms. Michelson interference measurements are performed to investigate the temporal and spatial coherence of polariton laser, with the coherence time and coherence length being τc∼0.97 ps and rc∼0.72μm at 440 K and 400 K, respectively.",

author = "Dan Xu and Wei Xie and Wenhui Liu and Jian Wang and Long Zhang and Yinglei Wang and Saifeng Zhang and Liaoxin Sun and Xuechu Shen and Zhanghai Chen",

year = "2014",

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day = "24",

doi = "10.1063/1.4866385",

language = "英语",

volume = "104",

journal = "Applied Physics Letters",

issn = "0003-6951",

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T1 - Polariton lasing in a ZnO microwire above 450 K

AU - Xu, Dan

AU - Xie, Wei

AU - Liu, Wenhui

AU - Wang, Jian

AU - Zhang, Long

AU - Wang, Yinglei

AU - Zhang, Saifeng

AU - Sun, Liaoxin

AU - Shen, Xuechu

AU - Chen, Zhanghai

PY - 2014/2/24

Y1 - 2014/2/24

N2 - Exciton-polariton lasing in a one-dimensional ZnO microcavity is demonstrated at high temperature of 455 K. The massive occupation of the polariton ground state above a distinct pump power threshold is clearly demonstrated by using the angular resolved spectroscopy under non-resonant excitation. The temperature dependence of the polariton lasing threshold is well interpreted by two competing mechanisms, i.e., the thermodynamic and kinetic mechanisms. Michelson interference measurements are performed to investigate the temporal and spatial coherence of polariton laser, with the coherence time and coherence length being τc∼0.97 ps and rc∼0.72μm at 440 K and 400 K, respectively.

AB - Exciton-polariton lasing in a one-dimensional ZnO microcavity is demonstrated at high temperature of 455 K. The massive occupation of the polariton ground state above a distinct pump power threshold is clearly demonstrated by using the angular resolved spectroscopy under non-resonant excitation. The temperature dependence of the polariton lasing threshold is well interpreted by two competing mechanisms, i.e., the thermodynamic and kinetic mechanisms. Michelson interference measurements are performed to investigate the temporal and spatial coherence of polariton laser, with the coherence time and coherence length being τc∼0.97 ps and rc∼0.72μm at 440 K and 400 K, respectively.

UR - https://www.scopus.com/pages/publications/84896791521

U2 - 10.1063/1.4866385

DO - 10.1063/1.4866385

M3 - 文章

AN - SCOPUS:84896791521

SN - 0003-6951

VL - 104

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

M1 - 082101

ER -

Polariton lasing in a ZnO microwire above 450 K

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