@inproceedings{4ac4ce427ce543c1ad8ed9265a5c993e,
title = "Pix2PixHD-Based Generation of SEM Image in the ETCH Domain by SEM Image of LITHO Domain",
abstract = "In semiconductor manufacturing, a forward etching process model that can accurately predict the pattern transformation from post-lithography (ADI) to post-etch (AEI) is greatly desired. However, current etching model is etch bias based, it is unable to offer rich information as the SEM image does for engineers to do wafer disposition. We propose an AEI image generation model using the Pix2PixHD. It can generate AEI images corresponding to ADI images. Experimental results demonstrate that our generated images achieve a SSIM of 96.7\% and a MSSIM of 94.2\% when compared to AEI images. Therefore, Our method can generate AEI images with a high resolution of (1024, 1024) and meet the requirements of applications.",
keywords = "deep learning, image generation, post-etch, post-lithography",
author = "Botong Zhao and Jiwei Shen and Hu Lu and Pengjie Lou and Wenzhan Zhou and Kan Zhou and Xintong Zhao and Shujing Lyu and Yue Lu",
note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 7th International Workshop on Advanced Patterning Solutions, IWAPS 2023 ; Conference date: 26-10-2023 Through 27-10-2023",
year = "2023",
doi = "10.1109/IWAPS60466.2023.10366092",
language = "英语",
series = "IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions",
address = "美国",
}