Photo-patternable GeO₂-contained organic-inorganic hybrid sol-gel films for photonic applications

Photo-patternable GeO₂-contained organic-inorganic hybrid films, which can be used for the low cost and mass production of integrated photonic circuits, were synthesized by combining a low-temperature sol-gel process with a spin-coating technique. Optical waveguide properties and photochemical activities of the hybrid sol-gel films were characterized and monitored by a prism coupling technique and a Fourier transform infrared spectroscopy. Advantages for fabrication of ridge structures based on the hybrid films were demonstrated by one-step spin-coating process followed by direct ultraviolet light irradiation. The results indicate that the asprepared photo-patternable hybrid materials have great applicability for the fabrication of photonic components, and the fabrication process has the advantages of cost-effect and very short processing time over inorganic materials patterning methods.