pFed-Litho: Lithography Modeling With a Personalized Federated Learning-Based Framework

Modeling lithography using machine learning is extremely data-intensive. Due to intellectual property privacy concerns and potential malicious attacks, design houses and foundries are unwilling to share their designs directly. To address the aforementioned concerns, we have proposed a personalized federated learning-based framework (pFed-Litho) to perform end-to-end lithography simulation. This framework incorporates a cross-level local training algorithm along with an integrated optimization method to generate personalized and local models, which overcome the generalization problem and slow convergence and oscillatory behavior in its loss function, respectively. The experimental results show that our pFed-Litho framework achieves up to 14.07% higher accuracy with reduced oscillatory behavior in the loss curve compared to the state-of-the-art works. Even with a dataset reduced by 100× , our framework maintains a stable accuracy of over 91%, representing a 50% increase compared to the U-Net model.