Abstract
Al doped Sb 2 Te 3 material was proposed to improve the performance of phase-change memory. Crystallization temperature, activation energy, and electrical resistance of the Al doped Sb 2 Te 3 films increase markedly with the increasing of Al concentration. The additional Al-Sb and Al-Te bonds enhance the amorphous thermal stability of the material. Al 0.69 Sb 2 Te 3 material has a better data retention (10 years at 110 °C) than that of Ge 2 Sb 2 Te 5 material (10 years at 87 °C). With a 100 ns width voltage pulse, SET and RESET voltages of 1.3 and 3.3 V are achieved for the Al 0.69 Sb 2 Te 3 based device.
| Original language | English |
|---|---|
| Pages (from-to) | 10667-10670 |
| Number of pages | 4 |
| Journal | Applied Surface Science |
| Volume | 257 |
| Issue number | 24 |
| DOIs | |
| State | Published - 1 Oct 2011 |
Keywords
- Phase transformation
- Thermal properties
- Thin films
- XPS