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Performance improvement of Sb 2 Te 3 phase change material by Al doping

  • Cheng Peng*
  • , Liangcai Wu
  • , Zhitang Song
  • , Feng Rao
  • , Min Zhu
  • , Xuelai Li
  • , Bo Liu
  • , Limin Cheng
  • , Songlin Feng
  • , Pingxiong Yang
  • , Junhao Chu
  • *Corresponding author for this work
  • East China Normal University
  • CAS - Shanghai Institute of Microsystem and Information Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Al doped Sb 2 Te 3 material was proposed to improve the performance of phase-change memory. Crystallization temperature, activation energy, and electrical resistance of the Al doped Sb 2 Te 3 films increase markedly with the increasing of Al concentration. The additional Al-Sb and Al-Te bonds enhance the amorphous thermal stability of the material. Al 0.69 Sb 2 Te 3 material has a better data retention (10 years at 110 °C) than that of Ge 2 Sb 2 Te 5 material (10 years at 87 °C). With a 100 ns width voltage pulse, SET and RESET voltages of 1.3 and 3.3 V are achieved for the Al 0.69 Sb 2 Te 3 based device.

Original languageEnglish
Pages (from-to)10667-10670
Number of pages4
JournalApplied Surface Science
Volume257
Issue number24
DOIs
StatePublished - 1 Oct 2011

Keywords

  • Phase transformation
  • Thermal properties
  • Thin films
  • XPS

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