Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching

Xiaoming Chen; Jilei Lin; Shaohui Xu; Peisheng Xin; Lianwei Wang

doi:10.1109/NEMS.2008.4484290

Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching

Xiaoming Chen, Jilei Lin, Shaohui Xu, Peisheng Xin, Lianwei Wang

School of Physics and Electronic Science

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

5 Scopus citations

Abstract

Silicon microchannel structures exhibit numerous possible applications. In this report, the oxidation of high area ratio silicon microchannels used in weak light detection and night vision is studied. High area ratio microchannels are fabricated by electrochemical etching, and the influences of oxidation time and environments on the microstructures are investigated and analyzed combined with computer simulation. Damages and distortion are found after the oxidation process. It is found that after oxidation at high temperature, surface morphology becomes rough and followed polishing step is recommended to smooth the silicon microchannels' surfaces.

Original language	English
Title of host publication	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
Pages	78-81
Number of pages	4
DOIs	https://doi.org/10.1109/NEMS.2008.4484290
State	Published - 2008
Event	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Sanya, China Duration: 6 Jan 2008 → 9 Jan 2008

Publication series

Name	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

Conference

Conference	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
Country/Territory	China
City	Sanya
Period	6/01/08 → 9/01/08

Keywords

HF concentration
High aspect ratio
Microchannel
Oxidation

Access to Document

10.1109/NEMS.2008.4484290

Cite this

Chen, X., Lin, J., Xu, S., Xin, P., & Wang, L. (2008). Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching. In 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 (pp. 78-81). Article 4484290 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS). https://doi.org/10.1109/NEMS.2008.4484290

@inproceedings{7cae0539a28d4796a51f1ddb2010b10a,

title = "Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching",

abstract = "Silicon microchannel structures exhibit numerous possible applications. In this report, the oxidation of high area ratio silicon microchannels used in weak light detection and night vision is studied. High area ratio microchannels are fabricated by electrochemical etching, and the influences of oxidation time and environments on the microstructures are investigated and analyzed combined with computer simulation. Damages and distortion are found after the oxidation process. It is found that after oxidation at high temperature, surface morphology becomes rough and followed polishing step is recommended to smooth the silicon microchannels' surfaces.",

keywords = "HF concentration, High aspect ratio, Microchannel, Oxidation",

author = "Xiaoming Chen and Jilei Lin and Shaohui Xu and Peisheng Xin and Lianwei Wang",

year = "2008",

doi = "10.1109/NEMS.2008.4484290",

language = "英语",

isbn = "9781424419081",

series = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS",

pages = "78--81",

booktitle = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008",

note = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 ; Conference date: 06-01-2008 Through 09-01-2008",

}

Chen, X, Lin, J, Xu, S, Xin, P & Wang, L 2008, Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching. in 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008., 4484290, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS, pp. 78-81, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, Sanya, China, 6/01/08. https://doi.org/10.1109/NEMS.2008.4484290

Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching. / Chen, Xiaoming; Lin, Jilei; Xu, Shaohui et al.
3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. p. 78-81 4484290 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching

AU - Chen, Xiaoming

AU - Lin, Jilei

AU - Xu, Shaohui

AU - Xin, Peisheng

AU - Wang, Lianwei

PY - 2008

Y1 - 2008

N2 - Silicon microchannel structures exhibit numerous possible applications. In this report, the oxidation of high area ratio silicon microchannels used in weak light detection and night vision is studied. High area ratio microchannels are fabricated by electrochemical etching, and the influences of oxidation time and environments on the microstructures are investigated and analyzed combined with computer simulation. Damages and distortion are found after the oxidation process. It is found that after oxidation at high temperature, surface morphology becomes rough and followed polishing step is recommended to smooth the silicon microchannels' surfaces.

AB - Silicon microchannel structures exhibit numerous possible applications. In this report, the oxidation of high area ratio silicon microchannels used in weak light detection and night vision is studied. High area ratio microchannels are fabricated by electrochemical etching, and the influences of oxidation time and environments on the microstructures are investigated and analyzed combined with computer simulation. Damages and distortion are found after the oxidation process. It is found that after oxidation at high temperature, surface morphology becomes rough and followed polishing step is recommended to smooth the silicon microchannels' surfaces.

KW - HF concentration

KW - High aspect ratio

KW - Microchannel

KW - Oxidation

UR - https://www.scopus.com/pages/publications/50349100598

U2 - 10.1109/NEMS.2008.4484290

DO - 10.1109/NEMS.2008.4484290

M3 - 会议稿件

AN - SCOPUS:50349100598

SN - 9781424419081

T3 - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS

SP - 78

EP - 81

BT - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008

T2 - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008

Y2 - 6 January 2008 through 9 January 2008

ER -

Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching

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Keywords

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