TY - JOUR
T1 - Optical second-harmonic generation in hydrogenated amorphous silicon single- and double-junction solar cells
AU - Ou-Yang, Wei
AU - Manaka, Takaaki
AU - Naitou, Seiichi
AU - Kunitomo, Kyoji
AU - Iwamoto, Mitsumasa
PY - 2012/7
Y1 - 2012/7
N2 - Using an electric-field-induced optical second-harmonic generation (EFISHG) technique, we studied the SHG from hydrogenated amorphous silicon (a-Si:H) solar cells. The SHG signal originating from a-Si interface is independent of external bias voltage (V ex), whereas that generated from the intrinsic layer is strongly dependent on V ex. The difference in the tendency of bias-dependent EFISHG intensity between a-Si singlejunction solar cells and a-Si/microcrystalline silicon (μc-Si) double-junction (tandem) solar cells indicates the presence of another origin of the EFISHG generation in the tandem cells. That is, the p-n junction formed between the p-type μc-Si:H and n-type a-Si:H. These findings indicate that the EFISHG technique is available for characterizing the local electric field in a-Si solar cells.
AB - Using an electric-field-induced optical second-harmonic generation (EFISHG) technique, we studied the SHG from hydrogenated amorphous silicon (a-Si:H) solar cells. The SHG signal originating from a-Si interface is independent of external bias voltage (V ex), whereas that generated from the intrinsic layer is strongly dependent on V ex. The difference in the tendency of bias-dependent EFISHG intensity between a-Si singlejunction solar cells and a-Si/microcrystalline silicon (μc-Si) double-junction (tandem) solar cells indicates the presence of another origin of the EFISHG generation in the tandem cells. That is, the p-n junction formed between the p-type μc-Si:H and n-type a-Si:H. These findings indicate that the EFISHG technique is available for characterizing the local electric field in a-Si solar cells.
UR - https://www.scopus.com/pages/publications/84863802581
U2 - 10.1143/JJAP.51.070209
DO - 10.1143/JJAP.51.070209
M3 - 文章
AN - SCOPUS:84863802581
SN - 0021-4922
VL - 51
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
IS - 7 PART 1
M1 - 070209
ER -