Nucleation mechanism and microstructural analysis of Zn films on Mo substrates by electrodeposition

P. Ren; H. Y. Deng; J. X. Zhang; N. Dai

doi:10.1149/2.0981607jes

Nucleation mechanism and microstructural analysis of Zn films on Mo substrates by electrodeposition

P. Ren
, H. Y. Deng
, J. X. Zhang
, N. Dai

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Zinc (Zn) films have been prepared on a molybdenum (Mo) substrate by the electrodeposition method from the electrolyte solutions of zinc chloride (ZnCl₂) and potassium chloride (KCl) added by surfactant PEG-6000. The influence of growth conditions on growth kinetics, morphologies and phase constitution of the films were investigated by cyclic voltammetry (CV), chronoamperometry (CA), scanning electron microscopy (SEM) and X-ray diffraction (XRD). Based on Scharifker-Hills model and microstructural analysis, it is found that the electrodeposition process of Zn films is mainly controlled by the diffusion process of zinc complex ions, and both progressive and instantaneous nucleation mechanisms are revealed and it is dependent on growth conditions such as main salt ZnCl₂ concentration and organic additive.

Original language	English
Pages (from-to)	D309-D313
Journal	Journal of the Electrochemical Society
Volume	163
Issue number	7
DOIs	https://doi.org/10.1149/2.0981607jes
State	Published - 2016
Externally published	Yes

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title = "Nucleation mechanism and microstructural analysis of Zn films on Mo substrates by electrodeposition",

abstract = "Zinc (Zn) films have been prepared on a molybdenum (Mo) substrate by the electrodeposition method from the electrolyte solutions of zinc chloride (ZnCl2) and potassium chloride (KCl) added by surfactant PEG-6000. The influence of growth conditions on growth kinetics, morphologies and phase constitution of the films were investigated by cyclic voltammetry (CV), chronoamperometry (CA), scanning electron microscopy (SEM) and X-ray diffraction (XRD). Based on Scharifker-Hills model and microstructural analysis, it is found that the electrodeposition process of Zn films is mainly controlled by the diffusion process of zinc complex ions, and both progressive and instantaneous nucleation mechanisms are revealed and it is dependent on growth conditions such as main salt ZnCl2 concentration and organic additive.",

author = "P. Ren and Deng, \{H. Y.\} and Zhang, \{J. X.\} and N. Dai",

year = "2016",

doi = "10.1149/2.0981607jes",

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journal = "Journal of the Electrochemical Society",

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TY - JOUR

T1 - Nucleation mechanism and microstructural analysis of Zn films on Mo substrates by electrodeposition

AU - Ren, P.

AU - Deng, H. Y.

AU - Zhang, J. X.

AU - Dai, N.

PY - 2016

Y1 - 2016

N2 - Zinc (Zn) films have been prepared on a molybdenum (Mo) substrate by the electrodeposition method from the electrolyte solutions of zinc chloride (ZnCl2) and potassium chloride (KCl) added by surfactant PEG-6000. The influence of growth conditions on growth kinetics, morphologies and phase constitution of the films were investigated by cyclic voltammetry (CV), chronoamperometry (CA), scanning electron microscopy (SEM) and X-ray diffraction (XRD). Based on Scharifker-Hills model and microstructural analysis, it is found that the electrodeposition process of Zn films is mainly controlled by the diffusion process of zinc complex ions, and both progressive and instantaneous nucleation mechanisms are revealed and it is dependent on growth conditions such as main salt ZnCl2 concentration and organic additive.

AB - Zinc (Zn) films have been prepared on a molybdenum (Mo) substrate by the electrodeposition method from the electrolyte solutions of zinc chloride (ZnCl2) and potassium chloride (KCl) added by surfactant PEG-6000. The influence of growth conditions on growth kinetics, morphologies and phase constitution of the films were investigated by cyclic voltammetry (CV), chronoamperometry (CA), scanning electron microscopy (SEM) and X-ray diffraction (XRD). Based on Scharifker-Hills model and microstructural analysis, it is found that the electrodeposition process of Zn films is mainly controlled by the diffusion process of zinc complex ions, and both progressive and instantaneous nucleation mechanisms are revealed and it is dependent on growth conditions such as main salt ZnCl2 concentration and organic additive.

UR - https://www.scopus.com/pages/publications/85014496688

U2 - 10.1149/2.0981607jes

DO - 10.1149/2.0981607jes

M3 - 文章

AN - SCOPUS:85014496688

SN - 0013-4651

VL - 163

SP - D309-D313

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 7

ER -

Nucleation mechanism and microstructural analysis of Zn films on Mo substrates by electrodeposition

Abstract

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