NIR-emitting erbium/oxygen-doped silicon by self-assembled techniques

  • Huimin Wen
  • , Jiajing He
  • , Jin Hong
  • , Fangyu Yue
  • , Yaping Dan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Self-assembled monolayer (SAM) techniques have been developed to dope silicon surfaces with use of erbium radiation sources. After rapid thermal annealing at 1050°C, surface monolayer structure and dopant concentration distribution were characterized by X-ray photoelectron spectroscopy and secondary ion mass spectroscopy measurements, respectively. A distinctive^{4}I-{13/2}\rightarrow^{4}I-{15/2} transition of erbium ion (4f) glowing at 1.54 \mum has been observed at room temperature for these Er/O-doped Si samples. With these preliminary results, it is promising to develop room-temperature silicon-based light-emitting devices and lasers on the basis of these bottom-up SAM techniques.

Original languageEnglish
Title of host publication2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728102863
DOIs
StatePublished - Jun 2019
Event2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019 - Xi'an, China
Duration: 12 Jun 201914 Jun 2019

Publication series

Name2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019

Conference

Conference2019 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2019
Country/TerritoryChina
CityXi'an
Period12/06/1914/06/19

Keywords

  • Erbium doping
  • NIR luminescence
  • Self-assembled monolayers
  • Silicon photonics

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