Near-Infrared Photoresponse Driven by Strong Interlayer Transition in 2D MoSe2/WSe2 van der Waals Heterostructures: Implications for Broadband Photodetectors

Rui Hu, Huiting Wang, Yanqing Gao, Yafang Li, Aiping Cao, Zixin Wang, Liyan Shang, Yawei Li, Kai Jiang, Jinzhong Zhang, Liangqing Zhu, Zhigao Hu

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Bandgap engineering of transition metal dichalcogenides (TMDCs) opens up opportunities to design broadband photodetectors via interlayer transition in type-II van der Waals (vdWs) heterostructures. However, the photoresponse related to interlayer coupling remains elusive, because of the limited efficiency of interlayer electron-hole generation and separation. Herein, we report the near-infrared optoelectronic response driven by the interlayer transition in MoSe2/WSe2 bilayer-bilayer vdWs heterostructure grown by one-pot chemical vapor deposition (CVD). It is found that the interlayer distance of the MoSe2 bilayer and WSe2 bilayer approximately reaches a single atomic layer, which enhances the strength of interlayer coupling. A substantial build-in potential in MoSe2/WSe2 heterostructure leads to rapid separation of photogenerated carriers. Moreover, this MoSe2/WSe2 bilayer-bilayer heterostructure exhibits high optoelectronic performance from the visible to near-infrared spectrum, obtaining a near-infrared photoresponse time of 38 μs at 940 nm. Our work may provoke further exploration of interlayer transition in type-II TMDCs heterostructures and their applications in broadband photodetectors.

Original languageEnglish
Pages (from-to)28798-28807
Number of pages10
JournalACS Applied Nano Materials
Volume7
Issue number24
DOIs
StatePublished - 27 Dec 2024

Keywords

  • bandgap engineering
  • interlayer transition
  • near-infrared photodetection
  • photoresponse time
  • type-II van der Waals heterostructures

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