Nano-structure fabrication for HgCdTe ultra-fast infrared sensors

  • Shao Wei Wang*
  • , Jianrong Yang
  • , Yifang Chen
  • , Honglou Zhen
  • , Xiaoshuang Chen
  • , Wei Lu
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

High-speed infrared sensors are necessary for broad applications in optic fibre communications with high data capacity and high security and distance sensing by laser. In this paper, an ultra-fast infrared sensor with 100 nm ballistic channels has been proposed and successfully fabricated by electron beam lithography. The area of photosensitive surface is as large as 100 μm × 100 μm to ensure its high sensitivity. The principle is based on the ballistic transport of electrons in the nano-scale channels. The frequency is expected to be in the range of 10 GHz, one or two orders higher than conventional photovoltaic sensors.

Original languageEnglish
Article number012023
JournalJournal of Physics: Conference Series
Volume188
DOIs
StatePublished - 2009
Externally publishedYes

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