Monolithically integrated electro-optic modulator fabricated on lithium niobate on insulator by photolithography assisted chemo-mechanical etching

  • Youting Liang
  • , Junxia Zhou
  • , Difeng Yin
  • , Yong Zheng
  • , Hongxin Qi
  • , Min Wang
  • , Zhiwei Fang
  • , Rongbo Wu*
  • , Ya Cheng*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Integrated electro-optic (EO) modulators are one of the building blocks of photonic integrated circuits. Here, we design and fabricate an EO Mach-Zehnder waveguide modulator on lithium niobate on insulator using photolithography assisted chemo-mechanical etching technology. We optimize the performance of multi-mode interferometer which serves as the 3 dB splitter as well as that of the inverse taper to achieve efficient fiber-waveguide coupling, resulting in a fiber-to-fiber insert loss of 7.6 dB for the fabricated device, with a half wave voltage (HWV) (Vπ) of 0.84 V and a HWV-length product (Vπ × L) of 3.4 V cm. The all-optical-lithography fabrication approach holds the promising potential for mass production of EO modulators of cost-effectiveness and low Vπ.

Original languageEnglish
Article number034019
JournalJPhys Photonics
Volume3
Issue number3
DOIs
StatePublished - Jul 2021

Keywords

  • Electro-optic modulator
  • Half wave voltage
  • Insert loss
  • Lithium niobate
  • Photolithography assisted chemo-mechanical etching

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